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Mask plate, method for carrying out exposure on the mask plate and liquid crystal panel comprising mask plate

A technology of mask plate and exposure mask, which is applied in the field of mask plate, can solve the problems of inconsistency of the light transmission area around the liquid crystal panel, affecting the display quality of the liquid crystal panel, and uneven TFT driving performance, so as to improve the display quality and make the transition of size change delicate , The effect of reducing the scrap rate

Active Publication Date: 2014-04-30
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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AI Technical Summary

Problems solved by technology

These exposure area differences mean that the central light-transmitting area of ​​the LCD panel is inconsistent with the surrounding light-transmitting area, resulting in uneven brightness of the LCD panel and poor display quality of the LCD panel.
Similarly, for array substrates, if the difference in pattern size is too large, it will directly reflect the uneven driving performance of TFTs, which will affect the display quality of LCD panels.

Method used

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  • Mask plate, method for carrying out exposure on the mask plate and liquid crystal panel comprising mask plate
  • Mask plate, method for carrying out exposure on the mask plate and liquid crystal panel comprising mask plate
  • Mask plate, method for carrying out exposure on the mask plate and liquid crystal panel comprising mask plate

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Embodiment Construction

[0024] The present invention will be further described below in conjunction with accompanying drawing.

[0025] figure 1 The positional relationship between the mask plate 10 and the corresponding exposure mask 20 according to the present invention is schematically shown. It should be understood that, figure 1 The curvature of the exposure mask 20 is shown enlarged. exist figure 1 In the illustrated embodiment, the center of the exposure mask 20 is bent toward the mask plate 10 relative to a predetermined horizontal line 21 and is lower than the horizontal line 21, while the edge portion is tilted away from the mask plate 10 and higher than the horizontal line 21. Viewed as a whole , the exposure mask 20 forms a concave mirror shape. Since the mask 10 is horizontal, the optical distance δ1 from the middle of the exposure mask 20 to the mask 10 is smaller than the optical distance δ2 from the edge of the exposure mask 20 to the mask 10 .

[0026] image 3 schematically sh...

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Abstract

The invention relates to a mask plate, a method for carrying out exposure on the mask plate and a liquid crystal panel comprising the mask plate. The mask plate is characterized by being provided with multiple pattern regions, wherein the multiple pixel regions are arranged according to the sizes of the multiple pixel regions from the center of the mask plate to the edge in a gradient changing manner. The method for carrying out exposure on the mask plate comprises the following steps: step1, horizontally arranging an exposure cover, and detecting the deformation degree of the exposure cover; step2, arranging the multiple pattern regions on the mask plate, and enabling the multiple pattern regions to set according to the deformation degree of the exposure cover from the center of the mask plate to the edge in the gradient changing manner; step 3, finishing the exposure of the mask plate. According to the mask plate provided by the invention, the influence of an exposure area of the mask plate because of bending deformation of the exposure cover is compensated.

Description

technical field [0001] The invention relates to the field of liquid crystal display, in particular to a mask plate. The invention also relates to a method of exposing such a mask. The invention also relates to a liquid crystal panel comprising such a mask. Background technique [0002] With the development of display technology, large-size, high-quality, and low-cost display devices have become a development trend. For the color filter as one of the main components of a display device (such as a TFT-LCD display device), its quality directly determines the display effect of the display device. [0003] At present, the most critical step in the TFT-LCD manufacturing industry is to expose the array substrate and the color filter plate. The photomask designer draws the product pattern within the specified size according to the size of the photomask used by the actual exposure machine. [0004] Ideally, the pattern size (CD) of the same design everywhere on the glass substrat...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/00G03F1/44G03F7/20G02F1/1335
CPCG02F1/133514G02F1/1303G02F1/134336G03F1/00
Inventor 李蒙王金杰
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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