A control system for amorphous silicon deposition
A control system and amorphous silicon technology, applied in gaseous chemical plating, coating, metal material coating process, etc., can solve the problems of difficult to change equipment process parameters, complex equipment structure, slow product replacement, etc. The modification is convenient and quick, the structure is simple, and the effect of meeting the requirements of precise control
Active Publication Date: 2016-09-21
SHAANXI TOPRAY SOLAR
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Problems solved by technology
[0002] At present, in the process of the industrialization of amorphous silicon in our country, the main mode is to purchase foreign equipment. Foreign equipment has a complex structure and is debugged by foreign technicians. Once the equipment process parameters are determined, it is difficult to change. From equipment research and development and process adjustment All are controlled by others, and product replacement is slow, and affected by the industry crisis, the research and development of amorphous silicon has also stagnated, which is not conducive to the technological innovation of the industry and the technological upgrading and product replacement of the amorphous silicon industry
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[0012] The present invention will be further described below in conjunction with the accompanying drawings.
[0013] Such as figure 1 The schematic block diagram of the structure of the present invention is shown, a control system for amorphous silicon deposition, including a processor, and a vacuum sensor, an argon valve, a nitrogen valve, an ignition power supply and a vacuum sensor connected to the processor, respectively. Vacuum pump, the processor is preferably PLC, and the starter power supply is preferably AE power supply.
[0014] In the above-mentioned control system for amorphous silicon deposition, a mass flow controller is further arranged between the processor and the argon gas valve, and a mass flow controller is further arranged between the processor and the nitrogen gas valve.
[0015] In the aforementioned control system for amorphous silicon deposition, the pump is a Roots pump.
[0016] In the above-mentioned control system for amorphous silicon deposition...
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The invention relates to a control system for deposition of amorphous silicon, and the system comprises a processor, and a vacuum sensor, an argon valve, a nitrogen valve and a starting power supply which are respectively connected with the processor, and a vacuum-pumping pump. The invention has the beneficial effects that: the vacuum sensor is used for measuring vacuum pressure variation data, and the data is sent to a PLC for data processing, further the automatic valve opening is adjusted for matching the control valve to automatically control indoor pressure. A mass flow controller is used for measuring flow change data of gas, which is sent to the PLC for gas flow data processing. The invention can satisfy accurate control requirement of technology to flow.
Description
technical field [0001] The invention relates to the field of automatic control, in particular to a control system for amorphous silicon deposition. Background technique [0002] At present, in the process of the industrialization of amorphous silicon in our country, the main mode is to purchase foreign equipment. Foreign equipment has a complex structure and is debugged by foreign technicians. Once the equipment process parameters are determined, it is difficult to change. From equipment research and development and process adjustment All are controlled by others, product replacement is slow, and affected by the industry crisis, the research and development of amorphous silicon has also stagnated, which is not conducive to the technological innovation of the industry and the technological upgrading and product replacement of the amorphous silicon industry. Contents of the invention [0003] In order to solve the above problems, the present invention provides a control syst...
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IPC IPC(8): C23C16/52C23C16/24
Inventor 陈五奎雷晓全任陈平王斌
Owner SHAANXI TOPRAY SOLAR