Primer composition and optical semiconductor apparatus using same
A technology for optical semiconductor devices and primers, applied in semiconductor devices, coatings, electro-solid devices, etc., can solve the problems of insufficient heat resistance of primer films, resin deterioration, film cracks, etc., and achieve excellent adhesion, Corrosion prevention and high reliability effects
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[0116] Hereinafter, although a synthesis example, an Example, and a comparative example are shown and this invention is concretely demonstrated, this invention is not limited to the following example.
Synthetic example 1
[0117] [Synthesis Example 1] Synthesis of polysilazane compound
[0118] Put 1,000 g of ethyl acetate into a 2 L four-necked flask equipped with a coiled cooler and a thermometer, and add 3.8 g (0.015 mol) of methacryloxypropyl trichlorosilane into the ethyl acetate 1. 41.5 g (0.28 mol) of methyltrichlorosilane was stirred in an ice bath. 15 g (0.89 mol) of ammonia gas was blown in when the inside of the system became 10 degreeC or less, and it stirred for 3 hours after blowing in. After completion of the stirring, by-product ammonium chloride was filtered off to complete a 4% by mass polysilazane solution of ethyl acetate.
[0119] use 29 Si-NMR, 1 When the synthesized polysilazane compound was measured by H-NMR, the structure of the polysilazane was as shown below, and the weight average molecular weight measured by GPC (tetrahydrofuran solvent (THF solvent)) was 2,000.
[0120]
Synthetic example 2
[0121] [Synthesis Example 2] Synthesis of polysilazane compound
[0122] Put 1,000 g of ethyl acetate into a 2 L four-necked flask equipped with a coiled cooler and a thermometer, and add 19 g (0.15 mol) of dimethyldichlorosilane, methyltrichlorosilane, and 22.5g (0.15mol), stirred under ice bath conditions. 14 g (0.83 mol) of ammonia gas was blown in when the inside of the system became 10 degreeC or less, and it stirred for 3 hours after blowing in. After completion of the stirring, by-product ammonium chloride was filtered off to complete a 4% by mass polysilazane solution of ethyl acetate.
[0123] use 29 Si-NMR, 1 When the synthesized polysilazane compound was measured by H-NMR, the structure of the polysilazane was as shown below, and the weight average molecular weight measured by GPC (THF solvent) was 2,000.
[0124] ((CH 3 ) 2 Si(NH) 2 / 2 ) 0.5 (CH 3 Si(NH) 3 / 2 ) 0.5
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