A direct-write vacuum evaporation system and method thereof

Abstract

Provided are a write-through vacuum evaporation system and a method therefor, belonging to the field of film-plating processing. The apparatus comprises an electron beam generating device, a vacuum evaporation chamber, a vacuum system, a sample chamber, a driver, a multi-channel signal acquiring and conditioning module, a main control computer, a quantum detection platform, a control cabinet, and a display and detection module. The method comprises: step 1, preparation; step 2: vacuum pumping; step 3, positioning; step 4, target material evaporation; step 5, film-plating by the deposition of a target material beam; step 6, movement of the sample stage in a specific track; step 7, judgement; step 8, quantum effect detection; and step 9, whether there is a quantum effect or not. The write-through vacuum evaporation system overcomes the film-plating mechanism of sample fixing in an existing vacuum evaporation system, and controls the evaporating material for plating a film, in a write-through form, onto a surface of a substrate in an ultra-precise movement, such that the processing requirements of graphic patterns, dot matrix and multilayer structures in preparation of quantum functional devices are achieved and the precision, efficiency and functions of the vacuum evaporation film-plating are effectively improved.

Description

technical field [0001] The invention relates to a vacuum evaporation system applied to coating processing, in particular to a direct-writing vacuum evaporation system based on a nano-manipulation system, which can realize direct evaporation processing of single-layer patterns, arrays and multi-layer composite structures. Background technique [0002] With people's in-depth understanding of the microscopic world, the quantum excitation, relaxation, and transport behaviors of device units approaching the quantum characteristic scale are gradually revealed and studied, and quantum regulation may be realized by changing various controllable conditions. The preparation of quantum functional devices is an important basis for quantum control research, and the advanced preparation and processing technology for high-precision and high-quality quantum functional devices is the foundation of success in research and application in this field. The current mainstream approach is to borrow...

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Problems solved by technology

[0007] The purpose of the present invention is to provide a brand-new vacuum evaporation coating system, which is used to solve the single coating structure in the prior art, which cannot independently complete the complex structural requirements of high precision and good quality, and the "grafting" of the microelectronics processing field. Problems of chemical reagents, impurities, process cross-contamination and damage caused by complex process methods

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