Direct-writing vacuum evaporating system and method thereof
A vacuum evaporation and direct writing technology, applied in vacuum evaporation plating, ion implantation plating, metal material coating technology, etc., can solve problems such as damage, pollution, and single coating structure
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[0071] The present invention will be further described in detail with reference to the accompanying drawings and embodiments.
[0072] The present invention aims to break through the limitations of the existing coating method of vacuum evaporation technology, and to provide a direct writing method with nano-shift positioning sample processing table as the core technology for various processes and precision requirements in the preparation of quantum functional devices and materials. type vacuum evaporation system.
[0073] The direct-writing vacuum evaporation system of the present invention takes an ultra-precise robust tracking algorithm as the control core, and introduces a mask mechanism 5, a nano-shift positioning sample stage 6, and a main control computer on the basis of the existing electron beam vacuum evaporation system 8's trajectory generation module 13, positioning control module 15, tracking control module 14, and display and detection module 10 modules, such as ...
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