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Direct-writing vacuum evaporating system and method thereof

A vacuum evaporation and direct writing technology, applied in vacuum evaporation plating, ion implantation plating, metal material coating technology, etc., can solve problems such as damage, pollution, and single coating structure

Inactive Publication Date: 2014-07-23
BEIHANG UNIV
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  • Abstract
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  • Application Information

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Problems solved by technology

[0007] The purpose of the present invention is to provide a brand-new vacuum evaporation coating system, which is used to solve the single coating structure in the prior art, which cannot independently complete the complex structural requirements of high precision and good quality, and the "grafting" of the microelectronics processing field. Problems of chemical reagents, impurities, process cross-contamination and damage caused by complex process methods

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  • Direct-writing vacuum evaporating system and method thereof
  • Direct-writing vacuum evaporating system and method thereof
  • Direct-writing vacuum evaporating system and method thereof

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Embodiment Construction

[0071] The present invention will be further described in detail with reference to the accompanying drawings and embodiments.

[0072] The present invention aims to break through the limitations of the existing coating method of vacuum evaporation technology, and to provide a direct writing method with nano-shift positioning sample processing table as the core technology for various processes and precision requirements in the preparation of quantum functional devices and materials. type vacuum evaporation system.

[0073] The direct-writing vacuum evaporation system of the present invention takes an ultra-precise robust tracking algorithm as the control core, and introduces a mask mechanism 5, a nano-shift positioning sample stage 6, and a main control computer on the basis of the existing electron beam vacuum evaporation system 8's trajectory generation module 13, positioning control module 15, tracking control module 14, and display and detection module 10 modules, such as ...

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Abstract

The invention discloses a direct-writing vacuum evaporating system and a method thereof and belongs to the technical field of coating process. The system includes an electronic beam generating device, a vacuum evaporating chamber, a vacuum system, a sample chamber, a driver, a multipath signal collecting and conditioning module, a main control computer, a quantum detection bench, a control cabinet and a display and detection module. The method includes steps of: 1: prerparing; 2: vacuumizing; 3: positioning; 4: evaporating a target material; 5: carrying out a deposition and a coating processes to a target material beam; 6: enabling a sample bench to moving in a specific track; 7: determining; 8: detecting quantum effect; and 9: determining whether the quantum effect exists or not. With the system, the problem of a mechanism of coating with a fixed sample in the vacuum evaporating system in the prior art is overcome. An evaporating material is controlled to be coated in a manner of direct-writing method onto a surface of a substrate which is in an ultraprecise movement. Processing requirements on patterns, dot matrixes and multi-layer structures during a manufacturing operation of a quantum functional apparatus are achieved. The vacuum evaporating process is effectively improved in precision, efficiency and functionality.

Description

technical field [0001] The invention relates to a vacuum evaporation system applied to coating processing, in particular to a direct-writing vacuum evaporation system based on a nano-manipulation system, which can realize direct evaporation processing of single-layer patterns, arrays and multi-layer composite structures. Background technique [0002] With people's in-depth understanding of the microscopic world, the quantum excitation, relaxation, and transport behaviors of device units approaching the quantum characteristic scale are gradually revealed and studied, and quantum regulation may be realized by changing various controllable conditions. The preparation of quantum functional devices is an important basis for quantum control research, and the advanced preparation and processing technology for high-precision and high-quality quantum functional devices is the foundation of success in research and application in this field. The current mainstream approach is to borrow...

Claims

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Application Information

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IPC IPC(8): C23C14/30C23C14/54
CPCC23C14/546C23C14/042
Inventor 闫鹏张立源张震郭雷
Owner BEIHANG UNIV
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