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A composite photonic film for multiple development and preparation method thereof

A multi-development, photonic technology, applied in chemical instruments and methods, optics, optical components, etc., can solve unseen problems and achieve the effect of good diffuse reflection performance, optimized hardness and flexibility, and high front light transmittance

Inactive Publication Date: 2016-02-24
上海乐屋印生物科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

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  • A composite photonic film for multiple development and preparation method thereof
  • A composite photonic film for multiple development and preparation method thereof

Examples

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Effect test

Embodiment 1

[0026] The chloroform solution of the PMMA of configuration 1g / L and PB mixture, PMMA and PB are configured according to the mass ratio 1:1 ratio, add the amphoteric copolymer polydodecyl acrylamide group that mass ratio is PMMA mass 1 / 2 in the solution- 6-acrylamidocaproic acid or copolymer polymethacrylmethacryloyloxyethyl-N,N-dimethyl-N-propanesulfonate amine salt-block-acrylamide until dissolved. Take the above solution at room temperature and place it in a petri dish with a diameter of 9cm. Methacryloxyethyl-N,N-dimethyl-N-propanesulfonic acid amine salt-block-acrylamide is 0.25g / L. The humid air flow with a relative humidity of 50% is blown to the surface of the solution at a speed of 4L / min, and soon an opaque film layer is formed on the surface of the polymer solution. After ten minutes, the solvent evaporates completely, and the film layer remains in the culture medium. The bottom of the dish; the surface of the ordered porous film is irradiated with ultraviolet rays...

Embodiment 2

[0029] The chloroform solution of the PMMA of configuration 1g / L and PB mixture, PMMA and PB are configured according to mass ratio 1:3 ratio, add the amphoteric copolymer polydodecyl acrylamide group that mass ratio is PMMA quality 1 / 2 in solution- 6-acrylamidocaproic acid or copolymer polymethacrylmethacryloyloxyethyl-N,N-dimethyl-N-propanesulfonate amine salt-block-acrylamide until dissolved. Take the above solution at room temperature and place it in a petri dish with a diameter of 9cm. Methacryloyloxyethyl-N,N-dimethyl-N-propanesulfonic acid amine salt-block-acrylamide is 0.125g / L. The humid air flow with a relative humidity of 50% is blown to the surface of the solution at a speed of 4L / min, and soon an opaque film layer is formed on the surface of the polymer solution. After ten minutes, the solvent evaporates completely, and the film layer remains in the culture medium. dish bottom. The surface of the ordered porous membrane is irradiated with ultraviolet rays, and t...

Embodiment 3

[0032] The chloroform solution of the PMMA of configuration 5g / L and PB mixture, PMMA and PB are configured according to mass ratio 1:1 ratio, add the amphoteric copolymer polydodecyl acrylamide group that mass ratio is PMMA quality 1 / 2 in solution- 6-acrylamidocaproic acid or copolymer polymethacrylmethacryloyloxyethyl-N,N-dimethyl-N-propanesulfonate amine salt-block-acrylamide until dissolved. Take the above solution at room temperature and place it in a petri dish with a diameter of 9cm. Methacryloxyethyl-N,N-dimethyl-N-propanesulfonic acid amine salt-block-acrylamide is 1.25g / L. The humid air flow with a relative humidity of 50% is blown to the surface of the solution at a speed of 4L / min, and soon an opaque film layer is formed on the surface of the polymer solution. After ten minutes, the solvent evaporates completely, and the film layer remains in the culture medium. dish bottom. The surface of the ordered porous membrane is irradiated with ultraviolet rays, and then ...

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Abstract

The invention discloses a preparation method of a photon array thin film used for multiple development. The preparation method comprises following steps: polymethyl methacrylate, polybutadiene, and an amphiphilic copolymer are dissolved in chloroform at a mass ratio of 1:1-3:0.5 so as to obtain a 1-5g / L chloroform solution; 5ml of the chloroform solution is delivered into a culture dish with a diameter of 9cm; air containing water vapour and ethanol is blown onto the surface of the chloroform solution in the culture dish until solvent volatilization is realized, and then a high-molecular polymer ordered array film is obtained; the high-molecular polymer ordered array film is subjected to aging for 30min under ultraviolet radiation conditions, and a surface structure is removed via adhesive tape adhesion so as to obtain a pin-cushion array film; sputtering of a layer of Pt or Pd metal onto the surface of the pin-cushion array film is realized by using an ion sputtering apparatus; 2ml of a chloroform solution of PMMA with a concentration of 1g / L is added onto the surface of the processed pin-cushion array film dropwise, and the composite photon thin film used for multiple development is obtained after volatilization of the chloroform solution of PMMA.

Description

technical field [0001] The invention belongs to a polymer lens array film material and a preparation method, in particular to the blending preparation of materials with convex lenses and concave lenses on the surface using templates. Background technique [0002] At present, the methods for preparing photonic thin films mainly include traditional lithography and self-assembly methods. [0003] 1. Photolithography: The photolithographic down-coating technique is energy intensive and requires complex instrumentation. [0004] 2. Photolithography process: The photolithography process consists of three processes: thin film deposition, photolithography and etching. Before photolithography, a thin film should be covered on the surface of the substrate. The thickness of the film is several angstroms to tens of microns. This process is called thin film deposition. The surface of the film is evenly covered with a layer of photoresist with a glue machine, and the process of transf...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08L33/12C08L47/00C08L33/24C08L53/00C08J5/18C23C14/46C23C14/20B32B15/082B32B27/06B32B27/16B32B27/30G02B1/00
Inventor 何蕾茵贾若琨杨晓航
Owner 上海乐屋印生物科技有限公司
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