waln hard nanostructure film and preparation method
A nano-structured and hard technology, applied in the direction of ion implantation plating, metal material coating process, coating, etc., can solve the problems of anti-oxidation performance and unsatisfactory friction and wear performance, and achieve high hardness and high wear resistance. Effect
Inactive Publication Date: 2016-08-31
JIANGSU UNIV OF SCI & TECH
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Problems solved by technology
[0003] In order to overcome the shortcomings of the existing WN-based hard nanostructured composite films and multilayer films with unsatisfactory anti-oxidation properties and friction and wear properties, the purpose of the present invention is to provide a WAlN hard nanostructured film with high hardness and thermal stability. It has good friction and wear performance, and has high production efficiency, and can be used as a nanostructured hard film for high-speed, dry cutting
Method used
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Effect test
Embodiment 2
[0027] Experimental parameters: W content is 87.65 at.%, Al content is 12.35 at.%, hardness is 30GPa. Under the dry cutting test, the average friction coefficient is 0.33, and the wear rate is 1.29×10 -8 mm 3 ·N -1 mm -1 .
Embodiment 3
[0029] Experimental parameters: W content is 77.97 at.%, Al content is 22.03 at.%, hardness is 34GPa. Under the dry cutting test, the average friction coefficient is 0.31, and the wear rate is 1.17×10 -8 mm 3 ·N -1 mm -1 .
Embodiment 4
[0031] Experimental parameters: W content is 67.6 at.%, Al content is 32.4 at.%, hardness is 37GPa. Under the dry cutting test, the average friction coefficient is 0.3, and the wear rate is 0.9×10 -8 mm 3 ·N -1 mm -1 .
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Abstract
This invention discloses a WAlN hard nanostructure film and its preparation method, which is characterized in that the film has a thickness of 1-3um and contains W, Al, and N elements, wherein the W content is 60at.%-100at.% and not equal to 100at.%, the Al content is 0at.%-40at.% and not equal to 0, and the N element exists in the form of a CrN transition layer. It is made of high-purity W target and Al target, and is deposited on cemented carbide or ceramic substrate by double-target confocal radio frequency reaction method. During deposition, the vacuum degree is better than 3.0×10 ‑3 Pa, start the arc with argon, nitrogen as the reaction gas, the flow ratio of argon and nitrogen is 10:(6‑15), and the sputtering pressure is 0.3Pa. The method has high production efficiency, and the obtained film has both high hardness and excellent friction performance, and can be used as a nanostructure hard film for high-speed, dry cutting.
Description
technical field [0001] The invention relates to a coating and a preparation method thereof, in particular to a WAlN hard nanostructure film and a preparation method thereof, belonging to the technical field of ceramic coatings. Background technique [0002] The development of modern processing technology has put forward higher service requirements for tool coatings such as "high speed and high temperature", "high precision", "high reliability" and "long life". In addition to high hardness and excellent high temperature oxidation resistance, the coating needs to have excellent friction and wear properties. However, although the existing tool coatings have high hardness, their friction and wear properties are not ideal, and it is difficult to meet the harsh service conditions such as high speed and dry cutting. Tungsten Nitride (W 2 N) has attracted the attention of researchers because of its high melting point, high hardness, stable chemical properties, low friction coeffic...
Claims
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IPC IPC(8): C23C14/35C23C14/06
Inventor 喻利花许俊华赵洪舰
Owner JIANGSU UNIV OF SCI & TECH