Wet etching device and etching method thereof

Abstract

The invention discloses a wet etching device which comprises an etching groove (110), a plurality of rolling wheels (120) arranged in the etching groove (110), a soaking groove (130) and a lifter (140). The rolling wheels (120) are used for bearing a base plate (150) to be etched, the soaking groove (130) is formed in the etching groove (110) and is arranged below the rolling wheels (120), the lifter (140) is arranged on the lower surface of a bottom plate (131) of the soaking groove (130), and the lifter (140) pushes the soaking groove (130) to ascend or descend so that etchants in the soaking groove (130) can soak or be separated from the base plate (150) to be etched. According to the device, the rolling wheels are utilized for conveying the base plate to the etching groove, meanwhile, the soaking groove can be filled with new etchants, and the soaking and etching time is shortened. In addition, the used etchants in the soaking groove can be completely discharged, and therefore the phenomenon that due to the insufficient replaceability of the etchants in the soaking groove, and long-time accumulation of the etchants, the etchants go bad is avoided.

Description

technical field [0001] The present invention relates to the technical field of wet etching, in particular to a wet etching device and an etching method thereof. Background technique [0002] The wet etching process refers to an etching technique that uses liquid chemicals to remove etchant. Wet etching is to use an appropriate etching solution to chemically react with the etchant to change the structure of the etchant, so that the part not covered by the photoresist is separated from the substrate surface, and the area covered by the photoresist is preserved. In this way, the desired pattern is obtained on the surface of the substrate. [0003] In the manufacturing process of the liquid crystal display panel, the wet etching modes for the glass substrate mainly include a spray (Spray) mode and a soak (Dip) mode. [0004] In traditional immersion mode, such as figure 1 As shown, the wet etching device includes an etching tank 11 and a plurality of parallel rollers 12 arran...

AI Technical Summary

Problems solved by technology

In addition, as the immersion etching progresses, the active components of the chemical etching solution in the etching tank 11 change rapidly, and the chemical etching solution in the etching tank 11 cannot be completely discharged through the valve 13 of the etching tank 11. , resulting in insufficient replacement capacity of the chemical etchant, long-term accumulation will cause the deterioration of the chemical etchant in the etching tank 11, thereby affecting the etching quality of the glass substrate 14

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