Unlock instant, AI-driven research and patent intelligence for your innovation.

Single-point linear evaporation source system

A linear evaporation source, single-point technology, applied in the field of evaporation source systems, can solve the problems of unbalanced saturated vapor pressure, poor film thickness uniformity, and non-uniform film thickness, and achieve the effect of improving uniformity and balance.

Active Publication Date: 2014-10-15
EVERDISPLAY OPTRONICS (SHANGHAI) CO LTD
View PDF3 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When using this point evaporation source system to evaporate thin films, the material utilization rate is low, generally less than 10%; the film uniformity is poor, generally less than 10%
That is, the saturated vapor pressure in the chamber is unbalanced, resulting in uneven thickness of the film deposited on the substrate 100, especially the evenness of the film thickness on both sides of the substrate 100 is worse.
When making large-scale films, the defects of poor coating uniformity of the traditional single-point linear evaporation source system are more obvious

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Single-point linear evaporation source system
  • Single-point linear evaporation source system
  • Single-point linear evaporation source system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0061] Such as figure 2 As shown, the first embodiment of the single-point linear evaporation source system of the present invention is used for evaporating thin films on a substrate 100 . The single-point linear evaporation source system of the first embodiment includes: a body 10 , a crucible 20 , two guide plates 70 and a plurality of nozzles 12 .

[0062] The main body 10 is parallel to the substrate 100 , is disposed below the substrate 100 , and has a certain distance from the substrate 100 . The body 10 can be made of metal materials such as white iron or titanium. The body 10 is elongated. For example, the body 10 is in the shape of a cuboid surrounded by a top surface, a bottom surface, two sides and two ends. There is a strip-shaped cavity in the body 10. room. In order to reduce the overall volume of the single-point linear evaporation source system, the length of the body 10 can be made shorter than the length of the substrate 100 , for example, the length of th...

Embodiment 2

[0069] Such as image 3 As shown, the structure of the second embodiment of the single-point linear evaporation source system of the present invention is basically the same as that of the first embodiment, except that the single-point linear evaporation source system of the second embodiment also includes a connecting pipe 30 . One end of the connecting pipe 30 communicates with the opening of the crucible 20 , and the other end communicates with the chamber, that is, the crucible 20 and the chamber communicate with each other through the connecting pipe 30 . The inner diameter of the connecting pipe is smaller than the size of the opening of the crucible 20 , which gathers the steam coming out of the crucible 20 and can reduce the overflow of steam in the crucible 20 , thereby reducing material waste.

[0070] Other structures of the single-point linear evaporation source system of the second embodiment are the same as those of the first embodiment, and will not be repeated h...

Embodiment 3

[0072] Such as Figure 4 As shown, the structure of the third embodiment of the single-point linear evaporation source system of the present invention is basically the same as that of the second embodiment, except that the single-point linear evaporation source system of the third embodiment also includes an exhaust pipe 40 , Gas box 50 and valve. One end of the exhaust pipe 40 communicates with the connecting pipe 30 , and the other end communicates with the gas collecting box 50 . The valve is installed in the connecting pipe 30 (not shown in the figure).

[0073] When the single-point linear evaporation source system was working, the valve was in the state of communicating with the crucible 20 and the chamber and disconnecting the crucible 20 and the exhaust pipe 40, so that the vapor coming out from the crucible 20 was led to the chamber; when the single-point linear evaporation source When the system stops working, the valve is in the state of disconnecting the crucible...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a single-point linear evaporation source system, which comprises a body, an evaporator and two guide plates. The body and a substrate are separated by certain distance. The body comprises a long strip chamber, and the body's side facing the substrate is provided with a plurality of nozzles communicated with the chamber so as to eject a vapor plating gas to the substrate. The evaporator is equipped with an opening part, which is communicated with the chamber, and the evaporator is used for evaporating a vapor plating material placed therein. The two guide plates are obliquely arranged at both ends inside the chamber, the peripheries of the guide plates and the body are in seal connection, and the distance between the two guide plates' ends close to the evaporator is smaller than that between the two guide plates' ends close to the substrate. The single-point linear evaporation source system provided by the invention can effectively improve the vapor pressure balance inside the chamber of the body, and thereby the uniformity of a film formed on the substrate by vapor plating can be improved.

Description

technical field [0001] The invention relates to an evaporation source system, in particular to a single-point linear evaporation source system. Background technique [0002] At present, the production of organic light-emitting diode (OLED) components is still dominated by thermal evaporation, and both evaporation source manufacturers and users are committed to improving the performance of evaporation sources, hoping to improve material utilization, reduce material costs, and improve The performance of OLED components, such as the uniformity of evaporated film thickness, etc. [0003] Existing types of evaporation sources used in thermal evaporation process mainly include point evaporation source system, cluster line evaporation source system, single point linear evaporation source system and surface evaporation source system. The point evaporation source system includes a crucible for placing evaporation materials, and the substrate is arranged above the crucible. When usi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C23C14/24
CPCC23C14/243C23C16/45578C23C14/0063C23C14/0084C23C14/22
Inventor 林进志周皓煜黄俊允
Owner EVERDISPLAY OPTRONICS (SHANGHAI) CO LTD