Polyimide coating and baking method

A polyimide coating and baking method technology, applied in the field of MEMS, can solve the problems of irregular distribution, scrapped chips, affecting imaging quality, etc., to reduce the problem of bubble defects, improve product yield and imaging quality, reduce The effect of bubble defects

A polyimide coating and baking method technology, applied in the field of MEMS, can solve the problems of irregular distribution, scrapped chips, affecting imaging quality, etc., to reduce the problem of bubble defects, improve product yield and imaging quality, reduce The effect of bubble defects

CN104261344BActive Publication Date: 2016-06-29北方广微科技有限公司

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  • Polyimide coating and baking method
  • Polyimide coating and baking method
  • Polyimide coating and baking method

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Embodiment Construction

[0048] Embodiments of the present invention are described in detail below.

[0049] Examples of the described embodiments are shown in the drawings, wherein like or similar reference numerals designate like or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary only for explaining the present invention and should not be construed as limiting the present invention. The following disclosure provides many different embodiments or examples for implementing different structures of the present invention. To simplify the disclosure of the present invention, components and arrangements of specific examples are described below. Of course, they are only examples and are not intended to limit the invention. Furthermore, the present invention may repeat reference numerals and / or letters in different instances. This repetition is for the purpose of simplicity and clarity and does not in i...

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Abstract

The invention provides a low-cost, low-defect-density high-viscosity polyimide coating and baking method, which comprises the following steps in sequence: coating a tackifier on the surface of a wafer; Carry out the first baking to the wafer of sticky agent; Carry out the first cooling to the wafer of described first baking; Coating polyimide on the wafer surface after described first cooling; To described coating The wafer with polyimide is subjected to the second baking; the second baked wafer is subjected to the second cooling; the second cooled wafer is subjected to ultraviolet baking, and the ultraviolet baking The mode of co-heating with vacuum suction cup and deep ultraviolet lamp is adopted. The embodiment of the present invention solves the problem of bubble defects caused by the high viscosity of PI glue, thereby improving the product yield and imaging quality.

Description

technical field [0001] The invention relates to the technical field of MEMS, in particular to a polyimide coating and baking method with low cost and low defect density. Background technique [0002] MEMS (Micro Electro Mechanical System) is an advanced manufacturing technology platform. It is developed on the basis of semiconductor manufacturing technology. MEMS technology adopts a series of existing technologies and materials such as photolithography, corrosion, and thin film in semiconductor technology. Infrared sensors with superior performance can be manufactured using advanced MEMS micromachining technology. Today, infrared sensors are used more and more widely, such as non-contact rapid measurement of body temperature in medicine, which is of great significance in the need to measure the temperature of a large number of people; in addition, it is also used in scientific research and military, such as Infrared spectrometer, missile guidance, thermal imaging, laser d...

Claims

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Application Information

Patent Timeline
29 Jun 2016
Publication
CN104261344B
IPC
B81C1/00; B05D1/38; B05D3/02; B05D3/00; B05C11/02
Inventors
高江; 雷述宇