High temperature pressure sensor process based on heavily doped 4h-sic substrate
A pressure sensor, heavily doped technology, applied in the measurement of the properties of piezoelectric resistance materials, electric solid devices, semiconductor devices, etc., can solve the problems of low yield and incomplete varieties.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0007] Below in conjunction with accompanying drawing and embodiment the present invention will be further described
[0008] A kind of preparation process of the high-temperature pressure sensor based on heavily doped 4H-SiC substrate described in the present invention, especially n-type heavily doped 4H-SiC substrate (such as figure 1 shown), including the following steps:
[0009] Step 1, preparing a 4H-SiC substrate: the substrate is a SiC wafer, polished on both sides, and cleaned by RCA.
[0010] Step 2, preparation of piezoresistive strips: pattern the substrate by photolithography, magnetron sputtering Ni, peel off the photoresist to realize pattern transfer, RIE (reactive ion etching) shallow etching of 2 μm, soak in Ni corrosion solution 10min, rinse with deionized water, N 2 blow dry.
[0011] Step 3, prepare the seed layer: use photolithography to pattern the substrate, use ultra-high vacuum magnetron sputtering equipment, radio frequency target position, 75W, 2...
PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com