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Radio frequency power supply system and a method for performing impedance matching by utilizing radio frequency power supply system

A technology of radio frequency power supply and matching device, which is applied in the direction of impedance network, circuit, electrical components, etc., and can solve the problems of slow response speed, high cost, narrow matching range, etc.

Inactive Publication Date: 2015-02-11
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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  • Abstract
  • Description
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Problems solved by technology

[0004] Since there are fewer adjustable components, the matching range of the entire matching system is narrow. If components with a large variable range are selected, the response speed will be slower and the cost will be higher.

Method used

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  • Radio frequency power supply system and a method for performing impedance matching by utilizing radio frequency power supply system
  • Radio frequency power supply system and a method for performing impedance matching by utilizing radio frequency power supply system
  • Radio frequency power supply system and a method for performing impedance matching by utilizing radio frequency power supply system

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Embodiment Construction

[0043] Specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings. It should be understood that the specific embodiments described here are only used to illustrate and explain the present invention, and are not intended to limit the present invention.

[0044] Such as figure 2As shown, as an aspect of the present invention, a kind of radio frequency automatic matching system is provided, and this radio frequency automatic matching system comprises radio frequency power source 10, plasma chamber 30 and the automatic impedance matching that is electrically connected between radio frequency power source 10 and plasma chamber 30 device 20, wherein the frequency of the RF power supply 10 can be at a minimum predetermined frequency f min and the maximum predetermined frequency f max By adjusting the frequency of the RF power supply 10 and adjusting the input impedance of the matching network through the automatic ...

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Abstract

The present invention provides a radio frequency power supply system. The radio frequency power supply system comprises a radio frequency power supply, and an automatic impedance matcher electrically between the radio frequency power supply and a plasma chamber. The frequency of the radio frequency power supply can be adjusted between the minimum preset frequency and the maximum preset frequency, and by means of adjustment of the frequency of the radio frequency power supply and adjustment of input impedance of a matching network by using the automatic impedance matcher, the input impedance of the matching network is equal to constant output impedance of the radio frequency power supply. The present invention further provides a method for performing impedance matching by using a radio frequency power supply system. By means of the radio frequency power supply system of the present invention, impedance matching can be achieved within a short time.

Description

technical field [0001] The present invention relates to the technical field of impedance matching, in particular to a radio frequency power supply system and a method for performing impedance matching using the radio frequency power supply system. Background technique [0002] In a typical radio frequency plasma generator, the radio frequency power source 10 with constant output impedance generates radio frequency waves with a fixed frequency to provide radio frequency power to the plasma chamber 30 to excite and generate plasma for etching or other processes. The constant output impedance of the RF generator is usually 50Ω, and the generated fixed frequency is usually 13.56MHz. Usually, the nonlinear load impedance of the plasma chamber 30 is not equal to the constant output impedance of the RF power supply 10, so there will be a relatively serious impedance mismatch between the RF power supply 10 and the plasma chamber 30, so that the There is relatively large reflected p...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H05H1/46
CPCH01L21/00H03L7/06H03H7/40
Inventor 张璐
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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