A cobalt antimonide-based thermoelectric thin film and its preparation method
A thermoelectric thin film, cobalt antimonide-based technology, applied in the field of cobalt antimonide-based thermoelectric thin film and its preparation, can solve the problems of low efficiency, cumbersome process, poor controllability, etc., achieve simplified preparation process, reduce cumbersome process, controllable strong effect
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[0050] Using In as the doping material (A), first of all, the CoSb 3 And In targets are respectively fixed on the two-station target frame of the sputtering instrument (multi-station sputtering system) to be sputtered; using polyimide (PI) as the base (insulating substrate), the substrate Place in a container, use acetone, alcohol and deionized water for ultrasonic cleaning in turn; the background vacuum of the sputtering system is pumped to 6.0×10 - 4 Pa, the flow rate is 40 sccmAr (high purity), and the working pressure is controlled at 3.0×10 -1 Pa; Use ion beam with ion source energy lower than 1KeV to bombard the surface of the substrate to further remove impurity molecules adsorbed on the surface of the substrate;
[0051] Such as figure 1 As shown, in the first embodiment, first, CoSb is plated on the substrate by the sputtering method. 3 Thermoelectric film, the total sputtering time is 60 min, when CoSb 3 When sputtering to 15 min, turn on the In sputtering source to let I...
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