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Shower type wet texturing equipment and method for solar silicon wafers

A technology of solar silicon wafer and wet method, which is applied in the fields of final product manufacturing, sustainable manufacturing/processing, semiconductor/solid device manufacturing, etc., and can solve the problems of reduced uniformity of silicon wafer surface treatment, influence of silicon wafer quality, and areas of chemical concentration Inconsistencies in chemical concentration and other problems can be achieved to ensure the uniformity of corrosion, improve the degree of production automation, and balance the effect of liquid concentration

Active Publication Date: 2017-06-13
CHANGZHOU S C EXACT EQUIP
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AI Technical Summary

Problems solved by technology

[0002] In the photovoltaic industry, the wet texturing of silicon wafers generally involves immersing silicon wafers in corrosive liquids for surface treatment. Due to the large amount of corrosive liquids in the reaction zone, the corrosive liquids involved in the reaction and the products after the reaction Doping with the corrosive solution that did not participate in the reaction will cause regional concentration inconsistencies in the concentration of the chemical solution in the reaction tank, which will greatly reduce the uniformity of the surface treatment of the silicon wafer and have a great impact on the quality of the processed silicon wafer

Method used

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  • Shower type wet texturing equipment and method for solar silicon wafers
  • Shower type wet texturing equipment and method for solar silicon wafers

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Embodiment Construction

[0022] In the wet texturing treatment of solar silicon wafers, the silicon wafers are generally immersed in corrosive liquids for surface treatment, and the corrosive liquids participating in the reaction and the products after the reaction are mixed with the corrosive liquids that did not participate in the reaction, resulting in a reaction The concentration of the chemical solution in the tank is inconsistent regionally, which affects the production quality of the silicon wafer. The present invention uses a shower to spray or drop the corrosion solution on the silicon wafer, and the excess chemical solution and reaction products can flow back to the auxiliary tank in time. Avoid the problem of uneven drug concentration on the silicon wafer.

[0023] The shower-type wet texturing equipment for solar silicon chips proposed by the present invention includes: a conveying component, a spraying component and a liquid supply component.

[0024] The conveying assembly includes rolle...

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Abstract

The invention discloses a shower-type wet texturing equipment for solar silicon wafers, which comprises: a conveying assembly for forwardly conveying the silicon wafers, a spray assembly arranged above the conveying assembly, and a liquid supply assembly arranged below the conveying assembly. Silicon wafers are placed on the transport component at intervals, the transport component transports the silicon wafer forward, and the spray box sprays the liquid medicine downward; the liquid medicine flowing down from the transport component aggregates in the liquid receiving tank. The present invention also provides a method for wet texturing of solar silicon wafers by utilizing the shower type wet texturing equipment. In the shower mode of the present invention, the corrosion liquid is sprayed or dripped onto the silicon chip, and excess chemical liquid and reaction products flow to the liquid receiving tank, thereby ensuring uniform corrosion of the silicon chip.

Description

technical field [0001] The invention relates to the photovoltaic industry, in particular to a shower-type wet texturing equipment and method for solar silicon wafers. Background technique [0002] In the photovoltaic industry, the wet texturing of silicon wafers generally involves immersing silicon wafers in corrosive liquids for surface treatment. Due to the large amount of corrosive liquids in the reaction zone, the corrosive liquids involved in the reaction and the products after the reaction Doping with the corrosive solution that did not participate in the reaction will cause regional concentration inconsistencies in the concentration of the chemical solution in the reaction tank, which will greatly reduce the uniformity of the surface treatment of the silicon wafer and have a great impact on the quality of the processed silicon wafer . [0003] Therefore, how to provide a shower-type wet texturing equipment and method for solar silicon wafers that can effectively impr...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L31/18H01L21/67
CPCH01L31/18H01L31/1876Y02E10/50Y02P70/50
Inventor 左国军
Owner CHANGZHOU S C EXACT EQUIP
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