planar magnetron cathode

A magnetron cathode, planar technology, applied in the field of sputtering sources, can solve the problems of thermal expansion of planar magnetron cathodes

Inactive Publication Date: 2017-08-25
WUHU VACUUM TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to overcome the problem of thermal expansion of the planar magnetron cathode in the prior art, and provide a planar magnetron cathode, which can prevent thermal expansion

Method used

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Embodiment Construction

[0018] Specific embodiments of the present invention will be described in detail below. It should be understood that the specific embodiments described herein are only used to illustrate and explain the present invention, but not to limit the present invention.

[0019] In the present invention, unless otherwise stated, the directional words used such as "inner and outer" refer to the inner and outer of the outline structure. "Far and near" means inside and outside with respect to a component.

[0020] The invention provides a planar magnetron cathode, which comprises: a core body, a magnet is embedded on the core body, and a channel is arranged on the magnet;

[0021] a copper plate that seals the channel;

[0022] The target material is formed by splicing a plurality of target blocks and is fixed on the copper plate.

[0023] Through the above-mentioned embodiments, the planar magnetron cathode of the present invention dissipates heat from the target material through the ...

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Abstract

The invention discloses a planar magnetron cathode. The planar magnetron cathode comprises: a nuclear body, a magnet is embedded in the nucleus, and a channel is arranged on the magnet; a copper plate, the copper plate seals the channel; a target The target material is formed by splicing a plurality of target blocks and is fixed on the copper plate. The planar magnetron cathode of the present invention can prevent thermal expansion.

Description

technical field [0001] The present invention relates to a sputtering source, in particular, to a planar magnetron cathode. Background technique [0002] When the planar magnetron cathode in the prior art works, the temperature is very high. In a high temperature environment, the working efficiency of the planar magnetron cathode decreases. In a high temperature environment, the planar magnetron cathode will thermally expand, which will reduce the planar magnetron cathode. To control the stability of the cathode, designing a low-temperature planar magnetron cathode has become an urgent problem to be solved. SUMMARY OF THE INVENTION [0003] The purpose of the present invention is to overcome the problem of thermal expansion of the planar magnetron cathode in the prior art, and to provide a planar magnetron cathode which can prevent thermal expansion. [0004] In order to achieve the above object, the present invention provides a planar magnetron cathode, the planar magnetr...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35
Inventor 薛辉任俊春金海涛
Owner WUHU VACUUM TECH
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