2 results about "Planar magnetron" patented technology

This utility model discloses a planar magnetron sputtering device belonging to the technical field of vacuum coating equipment. The device includes a motor, a main body, a target material, a cooling backplate, and a base. The core of this application lies in the fact that the cooling backplate is composed of a cooling substrate and a cover plate. The cooling substrate has a specially shaped receiving groove, which includes a first groove segment and a second groove segment connected to each other along its depth direction. The cover plate is embedded in the first groove segment to seal the lower second groove segment, thereby forming a completely closed cooling channel. This utility model, through this permanent sealing structure of embedding the cover plate in the receiving groove, replaces the traditional removable mechanical seal that relies on sealing gaskets, fundamentally solving the technical problem of leakage easily occurring in large-size cooling backplates under high water pressure.

The application belongs to the technical field of ion plating and specifically relates to a strip-shaped planar magnetron cathode with high target material utilization, which comprises a strip-shaped target material, a back plate, inner magnetic steels and outer magnetic steels, wherein the strip-shaped target material is fixed on the back plate, the outer magnetic steels are arranged on the side of the back plate opposite to the strip-shaped target material and contain at least one N-S magnetic pole pair, and the inner magnetic steels are completely embedded in the back plate, and each inner magnetic steel is arranged between the N-pole outer magnetic steel and the S-pole outer magnetic steel of the N-S magnetic pole pair. Each N-S magnetic pole pair generates a first parallel magnetic field B1 on the surface of the strip-shaped target material, and the inner magnetic steel between the N-S magnetic pole pair generates a second parallel magnetic field B2 on the surface of the strip-shaped target material, which is opposite to the direction of the first parallel magnetic field B1, and B1>B2. The inner magnetic steels with a specific magnetic field design are embedded in the back plate, the effect that the etching surface parallel magnetic field decreases with the increase of etching depth is achieved by embedding the inner magnetic steels, the target material is uniformly etched, and the target material utilization is improved.