5 results about "Planar magnetron" patented technology

This utility model discloses a planar magnetron sputtering device belonging to the technical field of vacuum coating equipment. The device includes a motor, a main body, a target material, a cooling backplate, and a base. The core of this application lies in the fact that the cooling backplate is composed of a cooling substrate and a cover plate. The cooling substrate has a specially shaped receiving groove, which includes a first groove segment and a second groove segment connected to each other along its depth direction. The cover plate is embedded in the first groove segment to seal the lower second groove segment, thereby forming a completely closed cooling channel. This utility model, through this permanent sealing structure of embedding the cover plate in the receiving groove, replaces the traditional removable mechanical seal that relies on sealing gaskets, fundamentally solving the technical problem of leakage easily occurring in large-size cooling backplates under high water pressure.

The invention belongs to the technical field of ion plating, and particularly relates to a strip-shaped planar magnetic control cathode with high target material utilization rate, which comprises a strip-shaped target material, a back plate, inner magnetic steel and outer magnetic steel, the strip-shaped target material is fixed on the back plate, and the outer magnetic steel is arranged on one side, back to the strip-shaped target material, of the back plate and comprises at least one N-S magnetic pole pair; the inner magnetic steel is completely embedded in the back plate, and each inner magnetic steel is correspondingly arranged between the N-pole outer magnetic steel and the S-pole outer magnetic steel of the N-S magnetic pole pair; each N-S magnetic pole pair generates a first parallel magnetic field B1 on the surface of the strip-shaped target material, the inner magnetic steel located between the N-S magnetic pole pairs generates a second parallel magnetic field B2 on the surface of the strip-shaped target material, the direction of the second parallel magnetic field B2 is opposite to that of the first parallel magnetic field B1, and B1 is larger than B2. The inner magnetic steel with a specific magnetic field design is embedded in the back plate, and the effect that the parallel magnetic field of the etching surface is reduced along with the increase of the etching depth is achieved by embedding the inner magnetic steel, so that the target material is uniformly etched, and the utilization rate of the target material is improved.

The disclosure provides a double injection planar magnetic control injection electron gun, which comprises a focusing electrode, two strip-shaped cathodes, an anode and a magnetic field generating assembly. The focusing electrode comprises two inclined surfaces extending in the Z-axis direction and arranged oppositely, the two strip-shaped cathodes are respectively installed on the inclined surfaces of the focusing electrode in parallel with each other, and the inclined surfaces are introduced with clockwise or counterclockwise rotation, and the cathodes are configured to respectively emit electrons after being heated; the anode forms an electric field with the two strip-shaped cathodes to accelerate the emitted electrons to form an electron beam; the electron beam rotates under the action of the magnetic field generated by the magnetic field generating assembly to form two strip-shaped electron beams, and reduce the included angle between the cross section of the motion trajectory of the two strip-shaped electron beams in the XY plane and the ZX plane.

The application discloses a rotating emission zone multi-injection magnetron injection electron gun structure applied to a planar gyrotron, and relates to the microwave, millimeter wave and electron optical technical fields.The structure comprises an anode and a cathode; the cathode is a central symmetrical structure and comprises a post-shaping electrode, an emission zone and a front-shaping electrode; wherein the emission zone is provided with an elliptical arc surface electron emission area which is rotated by a certain angle, and the electron emission area is laterally displaced; meanwhile, the post-shaping electrode and the front-shaping electrode are arranged as a special-shaped convex structure so as to adjust the electric field distribution.The application can control the shaping track of the elliptical electron injection to a certain extent, reduce the speed dispersion of the shaped electron injection, improve the working current of the magnetron injection electron gun, thereby increasing the output power of the planar magnetron injection electron gun and improving the efficiency of the planar gyrotron.

The application belongs to the technical field of ion plating and specifically relates to a strip-shaped planar magnetron cathode with high target material utilization, which comprises a strip-shaped target material, a back plate, inner magnetic steels and outer magnetic steels, wherein the strip-shaped target material is fixed on the back plate, the outer magnetic steels are arranged on the side of the back plate opposite to the strip-shaped target material and contain at least one N-S magnetic pole pair, and the inner magnetic steels are completely embedded in the back plate, and each inner magnetic steel is arranged between the N-pole outer magnetic steel and the S-pole outer magnetic steel of the N-S magnetic pole pair. Each N-S magnetic pole pair generates a first parallel magnetic field B1 on the surface of the strip-shaped target material, and the inner magnetic steel between the N-S magnetic pole pair generates a second parallel magnetic field B2 on the surface of the strip-shaped target material, which is opposite to the direction of the first parallel magnetic field B1, and B1>B2. The inner magnetic steels with a specific magnetic field design are embedded in the back plate, the effect that the etching surface parallel magnetic field decreases with the increase of etching depth is achieved by embedding the inner magnetic steels, the target material is uniformly etched, and the target material utilization is improved.