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Excitation modulation anode auxiliary magnetron sputtering ion plating system

An ion coating, magnetron sputtering technology, applied in sputtering coating, ion implantation coating, vacuum evaporation coating and other directions, can solve the problems affecting the controllability and repeatability of coating, difficult to control target poisoning, etc. The effect of improving ionization rate and sputtering yield, improving collision probability, and improving flexibility

Active Publication Date: 2020-07-14
LANZHOU INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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Problems solved by technology

[0005] However, the above-mentioned patents are difficult to control the target poisoning caused by reactive magnetron sputtering, which affects the controllability and repeatability of the coating

Method used

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  • Excitation modulation anode auxiliary magnetron sputtering ion plating system

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Embodiment Construction

[0028] Such as figure 1 As shown, an excitation modulation anode assisted magnetron sputtering ion coating system includes a vacuum chamber 1 connected together, a vacuum pump group 8, a vacuum measuring device 11 composed of a group of composite vacuum gauges, a power control cabinet and an automatic programming Controlled PLC+ICP+closed-loop control system9. One side of the vacuum chamber 1 is connected to the vacuum pump group 8 through the pipeline valve body 7 through the air pumping hole, and the other side is connected to the vacuum measuring device 11; A pair of planar magnetron targets 5 are arranged symmetrically on the front of the vacuum chamber door 2, and two pairs of auxiliary water-cooled anodes 4 with their own gas distribution systems are arranged symmetrically on the side; excitation field modulation coils 6 are arranged on the periphery of each auxiliary water-cooled anode 4; Two pairs of twin column magnetron sputtering cathodes 3 are symmetrically insert...

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Abstract

The invention relates to an excitation modulation anode auxiliary magnetron sputtering ion plating system. The system comprises a vacuum cavity, a vacuum pump set, a vacuum measuring device, a power supply control cabinet and a PLC+ICP+closed loop control system which are connected together. One side of the vacuum cavity is connected with the vacuum pump set through a pipeline valve body via an air exhaust hole, and the other side is connected with the vacuum measuring device; the vacuum cavity is provided with a vacuum cavity door body with a clam type hinged door; a pair of planar magnetroltargets are symmetrically arranged on the front surface of the vacuum cavity door body, and two pairs of auxiliary water-cooling anodes with gas distribution systems are symmetrically arranged on theside surfaces; an excitation field modulation coil is arranged on the periphery of each auxiliary water-cooled anode; two pairs of twin columnar magnetron sputtering cathodes are symmetrically inserted into the vacuum cavity; and the columnar magnetron sputtering cathodes, the auxiliary water-cooled anodes, the planar magnetron targets, the excitation field modulation coil, the pipeline valve body, the vacuum pump set and the vacuum measuring device are connected with the PLC+ICP+closed loop control system and the power supply control cabinet through line bridges correspondingly. According tothe system, target poisoning can be effectively prevented, and the coating quality is improved.

Description

technical field [0001] The invention relates to the technical field of vacuum coating and surface treatment, in particular to an excitation modulation anode assisted magnetron sputtering ion coating system. Background technique [0002] Material consumption and mechanical failure caused by friction and wear on the surface of industrial machinery lead to waste of energy and resources. Traditional surface treatment technologies, such as electroplating, micro-arc oxidation, anodic oxidation, etc., are gradually unable to meet the needs of the development of modern human society due to the strengthening of environmental protection policies and environmental protection awareness, and the development of green and environmentally friendly coating technologies is urgently needed. [0003] Therefore, arc ion plating, chemical vapor deposition and magnetron sputtering have received more and more attention. Taking magnetron sputtering as an example, balanced magnetron sputtering, unba...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/54
CPCC23C14/352C23C14/54
Inventor 张斌张俊彦高凯雄强力
Owner LANZHOU INST OF CHEM PHYSICS CHINESE ACAD OF SCI
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