Devices to prevent residual liquid from dripping

Abstract

The invention discloses a device for preventing residual liquid from dripping. The device comprises a pipeline, a cavity, a diaphragm, a plunger and a cylinder. The pipeline is provided with a liquid inlet and a liquid outlet. The cavity is communicated with the pipeline. The diaphragm is located at the joint of the cavity and the pipeline and separates the cavity from the pipeline. The plunger is arranged in the cavity. A sealed space is formed between the plunger and the diaphragm. The cylinder is connected with the plunger and can drive the plunger to move in the cavity so that the volume of the sealed space formed between the plunger and the diaphragm can be changed. By arranging the cavity, the diaphragm, the plunger and the cylinder, after liquid supply is ended, the cylinder drives the plunger to move, the gas pressure of the sealed space formed by the plunger and the diaphragm is smaller than the atmospheric pressure, and therefore the diaphragm protrudes out of the cavity, and liquid in the pipeline flows back and is prevented from dripping.

Description

technical field [0001] The invention relates to a solution supply device, in particular to a device for preventing residual liquid from dripping. Background technique [0002] In the manufacturing process of semiconductor devices, various solutions (such as deionized water, various chemical liquids, etc.) are usually used to treat the surface of the wafer. Such as Figure 4 As shown, it is a schematic structural diagram of an existing solution supply device, which includes a solution supply pipeline 101 and a pneumatic valve 102 arranged on the solution supply pipeline 101 . When supplying the solution, open the pneumatic valve 102, the solution enters the solution supply pipeline 101 from the liquid inlet of the solution supply pipeline 101, and then flows out from the liquid outlet of the solution supply pipeline 101, generally at the liquid outlet of the solution supply pipeline 101 A spray head is installed, and the solution is sprayed on the surface of the wafer throug...

AI Technical Summary

Problems solved by technology

At this time, although the solution supply has been stopped, there will still be residual solution in the solution supply pipeline 101, and the residual solution will flow out and drip from the liquid outlet of the solution supply pipeline 101. If the wafer has not been taken away, the remaining solution will The solution will drip on the surface of the wafer, which is undesirable in processes that require high precision

If the wafer has been taken away, the residual solution drips on the machine, which will cause corrosion to the machine and other electronic components. If the maintenance personnel accidentally touch it, it will also cause harm to the maintenance personnel.

[0003] Therefore, need to propose new device to solve the technical problem of residual liquid dripping that the above-mentioned device exists

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