Supercharge Your Innovation With Domain-Expert AI Agents!

An odorless acetone-free nail polish removing composition

一种组合物、指甲油的技术，应用在洗涤剂组合物、洗涤组合物溶剂、修指甲等方向，能够解决指甲不雅观等问题

Inactive Publication Date: 2015-06-17
LOREAL SA
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, although the composition according to patent 6,998,371 is acetone-free, it often leaves a greasy feel on the nails and makes the nails look unsightly

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • An odorless acetone-free nail polish removing composition
  • An odorless acetone-free nail polish removing composition
  • An odorless acetone-free nail polish removing composition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0050] Example 1 Exemplary Formulations

[0051] Exemplary formulations of compositions are presented herein as illustrations of the different components contained in acetone and ethyl acetate free and odorless nail polish removal compositions. All numbers in the table below are weight percents based on the total weight of the composition. The exemplary formulations in the table below are single phase formulations.

[0052] INCI name of component Preparation 1 Triacetin 14.94 Propylene Glycol 20 Propylene carbonate 65 Isopropyl myristate 0 Colorant 0.06

Embodiment 2

[0053] Example 2 Exemplary Formulations

[0054] Exemplary formulations of compositions are presented herein as illustrations of the different components contained in acetone and ethyl acetate free and odorless nail polish removal compositions. All numbers in the table below are weight percents based on the total weight of the composition. The exemplary formulations in the table below are biphasic formulations.

[0055] INCI name of component Preparation 2 Triacetin 10 Propylene Glycol 25 Propylene carbonate 40 Isopropyl myristate 25 Colorant 0

Embodiment 3

[0056] Embodiment 3 Consumer instant test

[0057] A consumer instant trial comparing the two formulations was performed. One of the formulations is the formulation according to the invention referred to as odor remover in this example, the formulation of which is set forth in the table below. All numbers in the table below are approximate weight percents based on the total weight of the composition.

[0058] INCI name of component odorless remover Triacetin 15 ideal propylene glycol 20 Propylene carbonate 65 Colorant 0.5

[0059] Another formulation is an acetone-based comparative formulation referred to as Acetone Remover in this example, the formulation of which is set forth in the table below. All numbers in the table below are approximate weight percents based on the total weight of the composition.

[0060] INCI name of component Acetone remover acetone 85 water 14.94 Colorant 0.06

[0061] The t...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

One aspect of the present invention comprises a nail polish removing composition that is essentially free of acetone and ethyl acetate, and is essentially free of odor. The composition includes at least one triester of glycerol and C2-C5 carboxylic acid, at least one C3-C5 glycol, at least one C4-C6 cyclic carbonate, and, optionally, at least one colorant. Another aspect of the present invention is a method of removing nail polish, comprising providing the nail polish removing composition; immersing an absorbent material in the composition, wherein the absorbent material absorbs the composition; contacting the absorbent material to nail polish for a time sufficient to plasticize the nail polish film; and removing the plasticized nail polish film by mechanically rubbing with the absorbent material, wherein the composition comprises one or more phases.

Description

Background technique [0001] Nail polish is usually removed using organic solvents such as acetone and ethyl acetate. While such organic solvents are generally effective in removing most types of nail polish, consumers do not consider them desirable because, among other reasons, they also have a strong odor and are harmful to nails and nail polish. Irritating to nearby skin. [0002] For example, acetone is an organic solvent that effectively dissolves nail polish and is a well-known component of nail polish removers. However, acetone can also remove moisture, so the nails and the skin near the nails may appear white and dry after contact with an acetone-based remover. In addition, acetone has a distinctive smell that some users find objectionable; and nail polish removers with 60% to 70% acetone are flammable. [0003] Another example of an organic solvent that can and is often used in nail polish removers is ethyl acetate. Although ethyl acetate is not as strong a solvent...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/37A61K8/34A61Q3/04
CPCA61K8/345A61K8/375A61K8/4973A61K2800/30A61Q3/04C11D3/2093C11D3/43
Inventor 达纳·奇费利
Owner LOREAL SA
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com