Semiconductor resistor structure and method of forming the same
A resistor structure and semiconductor technology, which is applied in semiconductor devices, semiconductor/solid-state device manufacturing, semiconductor/solid-state device components, etc., can solve the problems of small layout area, unstable resistance value, large layout area, etc., and achieve a wide adjustment range , strong usability effect
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[0079] The present invention will be further described below in conjunction with specific embodiments and accompanying drawings, but the protection scope of the present invention should not be limited thereby.
[0080] refer to figure 1 , The method for forming a semiconductor resistance structure according to this embodiment may include the following steps:
[0081] Step S11, providing a substrate;
[0082] Step S12, forming a well region of the first doping type in the substrate;
[0083] Step S13, forming a gate dielectric layer, the gate dielectric layer is at least partially located on the well region;
[0084] Step S14, forming a gate, the gate is at least partially located on the gate dielectric layer;
[0085] Step S15, forming a resistor body of a second doping type in the well region, at least a part of the resistor body is located under the gate and separated by the gate dielectric layer, and the second doping type and The first doping type is opposite.
[0086...
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