The invention relates to a junction termination structure of a transverse high-pressure
power semiconductor device, belonging to the technical field of
semiconductor power devices. An N-type drift region at a curvature termination of the transverse high-pressure
power semiconductor device is shortened in length to ensure that the N-type drift region is spaced with a P-well region by a certain displace, wherein the spaced part is replaced by a P-type substrate, which is equivalent that additional electric charges of the P-type substrate are introduced so that the
peak value of an
electric field at a pn junction formed the original P-well region and the N-type drift region is reduced, meanwhile, a new
peak value of the
electric field is introduced at a pn junction formed by the P-type substrate and the N-type drift region, the
radius of curvature of the curvature terminal is increased, the excessive concentration of a power line is avoided, and the puncture
voltage of the device is increased, wherein the surface of the N-type drift region also can be combined with a surface RESURF structure or an ultra-junction structure. The junction termination structure has the advantages of being capable of decreasing the width of the curvature terminal of the device, saving the
layout area of the device and being compatible with a
CMOS (Complementary
Metal-
Oxide-
semiconductor Transistor) process, and can be used for manufacturing the transverse high-pressure power device with the advantages of excellent performance,
high voltage, high speed and low
conduction loss.