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34results about How to "Channel width reduction" patented technology

Method for manufacturing a semiconductor device

A method of a semiconductor device comprises: a) depositing a first semiconductor layer and a second semiconductor layer in a semiconductor substrate in series; b) forming a first groove penetrating the first and second semiconductor layers and placed adjacent to an element region by partly etching the first and second semiconductor layers; c) forming a supporting member that supports the second semiconductor layer and covers over the second semiconductor layer and is embedded into the first groove; d) forming a second groove that exposes the first semiconductor layer from the bottom of the second semiconductor layer supported by the supporting member and is placed near the element region; and e) forming a cavity between the semiconductor substrate and the second semiconductor layer in the element region by etching the first semiconductor layer via the second groove under a specific condition in which the first semiconductor layer is easily etched, compared to the second semiconductor layer. Step b) further comprises: forming an alignment mark on the semiconductor substrate while forming the first groove by photolithography and etching for forming the first groove. Step d) further comprises aligning the position of photolithography by using the alignment mark.
Owner:SEIKO EPSON CORP

Transverse moving type parking system

The invention provides a transverse moving type parking system. The transverse moving type parking system comprises a transverse carrier and a parking space, wherein the transverse carrier comprises a bottom frame and an upper frame; the bottom frame comprises a middle axle and walking bridge frames arranged on the two sides of the middle axle; the walking bridge frames can drive the bottom frame to enter the bottom of a vehicle body in the transverse direction; the upper frame comprises an upper frame body capable of doing lifting motion and supporting mechanisms fixed to the two ends of the upper frame body; the supporting mechanisms can support the bottoms of wheels; the parking space comprises weighing mechanisms matched with the front wheels and the rear wheels correspondingly and a lifting platform located between the weighing mechanisms; each weighing mechanism comprises weighing units supporting the wheels on the two sides correspondingly; and the lifting platform can ascend to be flush with the surfaces of the weighing units. The transverse moving type parking system has the beneficial effects that transverse carrying of vehicles is achieved, the channel width of a stereo garage can be effectively reduced, the land utilization rate is increased, the vehicles can be parked on the round garage in the tangential direction, and therefore the diameter of the round garage is reduced, and the construction difficulty is lowered.
Owner:安徽博微联控科技有限公司

Backflow tank, matching structure and electroplating production line

PendingCN112746305AReduce breakage rateThe problem of reducing the effect of platingCellsTanksProduction lineMechanics
The invention relates to the technical field of electroplating, and particularly discloses a backflow tank, a matching structure and an electroplating production line. The backflow tank comprises a tank body, a first plate is arranged in the tank body to divide an inner cavity of the tank body into a first backflow cavity and a plate passing channel which are arranged side by side, the two ends, in the length direction, of the plate passing channel penetrate through the two opposite side walls of the tank body, and a first inlet and a first outlet are correspondingly formed in the two side walls of the tank body , so that a workpiece can pass through the plate passing channel. The first plate divides the inner cavity of the tank body into the first backflow cavity and the plate passing channel which are arranged side by side, a first inlet and a first outlet of the plate passing channel penetrate through two oppositely-arranged side walls on the tank body, and when the workpiece enters the plate passing channel from a previous procedure, the workpiece can enter the plate passing channel along the first inlet and is output from the plate passing channel from the first outlet, so that the workpiece can be smoothly conveyed in the plate passing channel in the conveying process, and the breakage rate of the workpiece is reduced.
Owner:KUNSHAN DONGWEI MACHINERY CO LTD

Mixing condensing system based on up-in-down-out superposed double-flow-path steam condenser

The invention discloses a mixing condensing system based on an up-in-down-out superposed double-flow-path steam condenser. The steam condenser is connected with an input end of a mixing condenser through an air extracting pipeline, and an output end of the mixing condenser is connected with the steam condenser through a condenser reflux pipeline and also connected with the condenser air extracting pipeline through a vacuum pump. A circulating water inlet is higher than a circulating water outlet. A first flow path pipe bundle region is positioned above a second flow path pipe bundle region. By adopting the single-back-pressure up-in-down-out superposed double-flow-path steam condenser (of which the first flow path pipe bundle region is above the second flow path pipe bundle region) and the mixing condensing system thereof, the mainstream flow path of the condenser exhaust steam is short, the flow resistance is small, the exhaust steam dynamic pressure can be converted into static pressure more easily, and the heat exchange effect is reinforced. More importantly, the channel width of the condenser exhaust steam flowing to the lower pipe bundle can be reduced, and the pipe bundle layout density can be increased to re-optimize the tube bundle arrangement, thereby lowering the height or width of the condenser pipe bundle region and lowering the condenser exhaust steam pressure.
Owner:CENT SOUTHERN CHINA ELECTRIC POWER DESIGN INST CHINA POWER ENG CONSULTING GROUP CORP

Semiconductor structure and preparation method thereof

The invention relates to a semiconductor structure and a preparation method thereof. The method comprises the steps that: a substrate is provided, a shallow trench isolation structure is formed in the substrate, wherein the shallow trench isolation structure defines a plurality of active regions which are arranged at intervals in the substrate through isolation; a word line groove is formed in the substrate, and the depth of the part, located in the active regions, of the word line groove is smaller than that of the part, located in the shallow groove isolation structure, of the word line groove, so that a first protruding structure is formed at the bottom of the part, located in the active regions, of the word line groove; an etching protection layer is formed on the surface of the first protruding structure; a part of the shallow trench isolation structure is removed, so that a second protruding structure is formed based on the first protruding structure, the upper side wall and the top of the second protruding structure are covered with the etching protection layer, and the lower part of the second protruding structure is exposed by the removed part of the shallow trench isolation structure; the lower part of the second protruding structure is etched, so that the width of the lower part of the second protruding structure is smaller than that of the upper part of the second protruding structure; and a word line structure is formed in the word line groove.
Owner:CHANGXIN MEMORY TECH INC

High-density array disk cabinet

The invention relates to a high-density array disk cabinet, which includes a cabinet body, a plurality of disk array hosts, and a management communication unit. The cabinet body is a standard cabinetbody and is divided into a plurality of installation units. The management communication unit is installed in one of the installation units. The other installation units are all provided with two-wayslide rails. Two disk array hosts are slidingly mounted on the two-way slide rails, and can be pushed and pulled from the front side and the back side of the cabinet body respectively. Each disk arrayhost includes a frame, a control circuit board, two interface circuit boards and multiple cloud disks. The control circuit board is connected to the management communication unit through a retractable power line and a network cable. The interface circuit board is electrically connected to the control circuit board and has two rows of interfaces on its upper surface. The cloud disks are distributed on both sides of the interface circuit board and are connected with the interfaces through corresponding connecting wires. By using the standard cabinet body, the high-density array disk cabinet canbe put in a standard computer room and has a compact structure. A 42U standard cabinet can store up to 1728 cloud disks, which greatly improves the space utilization rate of the cabinet.
Owner:厦门翼加云软件有限公司
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