Measuring Method of Optical Fiber Diffraction Reference Wavefront Deviation by Fiber Point Diffraction Interferometer
A technology of point diffraction interferometer and reference wavefront, which is applied in the field of optical measurement to achieve the effect of ensuring orthogonality, improving precision and avoiding offset
Active Publication Date: 2018-07-27
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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[0005] As the highest precision interferometer that can be achieved at present, the point diffraction interferometer has a higher precision of the diffraction reference wavefront than itself. direct measurement of the mass of the
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[0034] The present invention will be described in further detail below in conjunction with the accompanying drawings and embodiments.
[0035] Such as figure 1As shown, the optical fiber point diffraction interferometer fiber diffraction reference wavefront deviation measurement method uses four optical fibers for shearing interferometry, and the method includes the following components: laser 1, neutral density filter 2, 1 / 2 wave plate 3 , the first polarization beam splitter prism 4, the first 1 / 4 wave plate 5, the first corner cube prism 6, the first plane mirror 7, the second 1 / 4 wave plate 8, the second plane mirror 9, the second angle Axicon prism 10, piezoelectric ceramics 11, second polarization beam splitter prism 12, second polarizer 13, second coupling lens 14, first polarizer 15, first coupling lens 16, third optical fiber 17a, fourth optical fiber 17b, The first optical fiber 18a, the second optical fiber 18b, the second optical fiber diffracted spherical wave 19...
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The optical fiber point diffraction interferometer optical fiber diffraction reference wavefront deviation measurement method relates to the field of optical measurement technology. The deviation of the direction is evaluated, so as to realize the complete investigation of the deviation of the fiber diffraction reference wavefront from the experiment, which can solve the problem of measuring the deviation of the fiber diffraction reference wavefront. In the present invention, two spherical waves generated by optical fiber diffraction are directly subjected to shearing interference in two orthogonal directions perpendicular to each other, and the deviation in two orthogonal directions of the fiber diffraction reference wave front can be obtained from the shearing interferogram, which overcomes the With higher requirements for detection equipment, the deficiency of evaluating the reference wavefront deviation of fiber diffraction in a single direction is avoided.
Description
technical field [0001] The invention relates to the technical field of optical measurement, in particular to a method for measuring the deviation of a high-precision reference wavefront of optical fiber diffraction by an optical fiber point diffraction interferometer. Background technique [0002] Extreme Ultraviolet Lithography (EUVL) is a photolithography process suitable for the manufacture of several generations of ultra-large-scale integrated circuits at 22nm and below. It uses an exposure wavelength of 13.5nm to image the circuit pattern on the mask onto the wafer. Because in the EUV band, the refractive index of various materials is close to 1, and the absorption is very large, the EUVL projection exposure objective lens system must adopt a total reflection optical system composed of optical aspheric surfaces coated with multi-layer films. [0003] In order to make the graphics on the mask nearly perfect on the wafer, the projection exposure objective lens system is r...
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IPC IPC(8): G01M11/02
Inventor 金春水卢增雄马冬梅张海涛于杰
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI