Gan-based LED epitaxial structure with asymmetric superlattice layer and method for its preparation
A superlattice layer and epitaxial structure technology, applied in electrical components, circuits, semiconductor devices, etc., can solve the problems of hindering the ability to activate lateral expansion, adverse luminous efficiency, etc., so as to improve the overall luminous efficiency, improve the injection efficiency, and reduce restrictions. Effect
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[0033] In order to enable those skilled in the art to better understand the technical solutions in the present invention, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described The embodiments are only some of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts shall fall within the protection scope of the present invention.
[0034] ginseng figure 1 As shown, the present invention discloses a GaN-based LED epitaxial structure with an asymmetric superlattice layer, which includes from bottom to top:
[0035] Substrate 10, the substrate material is usually a sapphire substrate, and can also be other substrate materials, such as Si, SiC, etc.;
[0036] The ni...
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