Chlorella silk mask for eliminating the turbid, beautifying skin and repairing radiation damage

A chlorella and facial mask technology, applied in cosmetics, preparations for skin care, cosmetic preparations, etc., can solve the problems of increased sensitization, allergic reactions, skin irritation, erythema and rashes by biological substances, and achieve rich Vitality, promoting water-oil balance, refreshing and comfortable skin

Inactive Publication Date: 2015-09-30
DONGGUAN FADA CLOTHING CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, while many preservatives kill microorganisms such as bacteria and fungi, they can also irritate the skin, and even cause rashes

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0041] (1) Weigh the raw materials according to the following parts by weight, mix them uniformly, and prepare a facial mask liquid: a chlorella turbidity-removing and beauty-care radiation repairing silk mask, which is characterized in that the chlorella turbidity-removing and beauty-care radiation repairing silk mask is made of mulberry The silk nutritional facial mask is made by soaking the spunlace non-woven fabric in the mask liquid, and the mask liquid is composed of the following raw materials in parts by weight: 75 parts of water, 2 parts of 1,3-butanediol, and 8 parts of chlorella extract , 8 parts of rose extract, 1 part of betaine, 2 parts of 1,2-propanediol, 10.5 parts of acetyl hexapeptide, 0.25 parts of xanthan gum, 20.2 parts of acetyl tetrapeptide, 0.3 parts of sodium hyaluronate, serine 0.8 parts, 0.8 parts of citrulline, 0.5 parts of nicotinamide, 0.5 parts of methylisothiazolinone, 0.1 parts of PEG-40 hydrogenated castor oil, 0.005 parts of essence;

[0042]...

Embodiment 2

[0046] Prepared according to the method described in Example 1, wherein the essence is formed by blending eugenol and raspberry ketone in a weight ratio of 1:1. Obtain the chlorella turbidity-removing and beauty-beautifying radiation-repairing silk mask of Example 2.

Embodiment 3

[0048] Prepared according to the method described in Example 1, wherein the essence is formed by blending ebony extract and raspberry ketone in a weight ratio of 1:1. Obtain the chlorella turbidity-removing and beautifying-beautifying radiation-repairing silk mask of Example 3.

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PUM

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Abstract

The invention discloses a chlorella silk mask for eliminating the turbid, beautifying skin and repairing radiation damage. The mask is manufactured by soaking non-woven fabric in mask essence. The mask essence comprises, by weight, 50-80 parts of water, 2-10 parts of 1,3-butanediol, 5-10 parts of chlorella extracts, 5-10 parts of rose extracts, 1-5 parts of betaine, 1-5 parts of 1,2-propylene glycol, 0.5-2 parts of acetyl hexapeptide-1, 0.25-0.5 part of xanthan gum, 0.2-1 part of acetyl tetrapeptide-2, 0.3-0.5 part of sodium hyaluronate, 0.8-1.5 parts of serine, 0.8-1.5 parts of citrulline, 0.5-1 part of nicotinamide, 0.5-1 part of methylisothiazolinone, 0.1-0.5 part of PEG-40 hydrogenated castor oil and 0.005-0.01 part of essence. The mask can deeply purify pores, clean away abundant grease, and promote water and grease balance of the skin, enables the skin cool, comfortable and vigorous and meanwhile has an anti-radiation function.

Description

technical field [0001] The invention relates to a mask, in particular to a chlorella turbidity-removing, beauty-beautifying, radiation-repairing silk mask. Background technique [0002] Mask is an important part of skin care. Regular application of mask according to various skin characteristics can degrease oily skin, shrink large pores, restore luster to dry and wrinkled skin, and inhibit inflammation of acne-prone skin. After the mask is used, the skin looks refreshed, smooth, white and tender. This is because when the mask is applied to the skin, the mask has an affinity with the skin. As the mask gradually dries, the skin temperature rises, blood circulation accelerates, and the skin becomes taut and firm. The tension is strengthened, the sebum and moisture secreted by the skin reverse osmosis into the stratum corneum, making the epidermis soft and stretched, the pores are instinctively opened, the active ingredients in the mask penetrate into the skin and are absorbed b...

Claims

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Application Information

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IPC IPC(8): A61K8/97A61Q19/00A61Q17/04
Inventor 王洪海
Owner DONGGUAN FADA CLOTHING CO LTD
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