Gallium nitride-based low-leakage current solid-supported beam field-effect transistor inverter and its preparation method
A gallium nitride-based, solid-supported beam technology, applied in transistors, semiconductor/solid-state device manufacturing, circuits, etc., to achieve improved performance, reduced power consumption, and reduced gate leakage current
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[0047] The invention is composed of a fixed-beam N-type MESFET1 and a fixed-beam P-type MESFET2. The transistor of the inverter is made on the basis of a semi-insulating GaN substrate 3, and its input lead 4 is made of gold. The source 12 of the fixed-beam N-type MESFET1 is grounded, and the source 13 of the fixed-beam P-type MESFET2 is connected to the power supply. The drain 15 of the fixed beam N-type MESFET1 is short-circuited with the drain 16 of the fixed beam P-type MESFET2. The gate 5 of the MESFET in the present invention forms a Schottky contact with the active layer, and a fixed support beam 6 is designed above the gate 5 . The two MESFET fixed support beams are shorted. The two anchor regions 7 of the anchor beam 6 are fabricated on the semi-insulating GaN substrate 3 . Two electrode plates 8 are designed under each fixed support beam 6 , and the top of the electrode plates is covered with a silicon nitride layer 9 . The electrode plate 8 of each MESFET is short...
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