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Gallium nitride-based low-leakage current solid-supported beam field-effect transistor inverter and its preparation method

A gallium nitride-based, solid-supported beam technology, applied in transistors, semiconductor/solid-state device manufacturing, circuits, etc., to achieve improved performance, reduced power consumption, and reduced gate leakage current

Active Publication Date: 2018-01-16
SOUTHEAST UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Excessive power consumption will also make various mobile portable devices have to face problems such as power supply life and heat dissipation
Therefore, the high power consumption of integrated circuits puts forward higher requirements on the heat dissipation performance and stability of the equipment, and the battery life of various mobile and portable equipment is also increasingly challenged.

Method used

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  • Gallium nitride-based low-leakage current solid-supported beam field-effect transistor inverter and its preparation method
  • Gallium nitride-based low-leakage current solid-supported beam field-effect transistor inverter and its preparation method
  • Gallium nitride-based low-leakage current solid-supported beam field-effect transistor inverter and its preparation method

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Embodiment Construction

[0047] The invention is composed of a fixed-beam N-type MESFET1 and a fixed-beam P-type MESFET2. The transistor of the inverter is made on the basis of a semi-insulating GaN substrate 3, and its input lead 4 is made of gold. The source 12 of the fixed-beam N-type MESFET1 is grounded, and the source 13 of the fixed-beam P-type MESFET2 is connected to the power supply. The drain 15 of the fixed beam N-type MESFET1 is short-circuited with the drain 16 of the fixed beam P-type MESFET2. The gate 5 of the MESFET in the present invention forms a Schottky contact with the active layer, and a fixed support beam 6 is designed above the gate 5 . The two MESFET fixed support beams are shorted. The two anchor regions 7 of the anchor beam 6 are fabricated on the semi-insulating GaN substrate 3 . Two electrode plates 8 are designed under each fixed support beam 6 , and the top of the electrode plates is covered with a silicon nitride layer 9 . The electrode plate 8 of each MESFET is short...

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Abstract

The invention relates to a GaN-based low-leakage current fixed-beam field-effect transistor inverter and a preparation method thereof. The GaN-based low-leakage current fixed-beam MESFET inverter consists of a fixed-beam N-type MESFET and a fixed-beam P type MESFET configuration. The MESFET of the inverter is fabricated on a semi-insulating GaN substrate, and a fixed beam structure is designed above the gate. An electrode plate is designed under the fixed support beam. The pull-down voltage of the fixed beam is designed to be equal to the absolute value of the threshold voltage of the MESFET. When the voltage between the fixed beam and the electrode plate is less than the absolute value of the threshold voltage, the fixed beam is suspended above the grid. At this time, the grid is open and the MESFET is not turned on. When the voltage between the beam and the electrode plate reaches or exceeds the absolute value of the threshold voltage, the fixed beam will be pulled down to stick to the grid, and the grid and the fixed beam are short-circuited, thereby turning on the MESFET. The invention increases the impedance of the gate during operation, reduces the leakage current of the gate, and effectively reduces power consumption.

Description

technical field [0001] The invention provides a GaN-based low-leakage current solid-supported beam MESFET inverter, which belongs to the technical field of micro-electromechanical systems. Background technique [0002] With the development of microelectronics and microwave communication technology, the requirements for the performance of radio frequency integrated circuits are getting higher and higher at home and abroad, and people also put forward higher requirements for the speed and power consumption of devices. Metal-semiconductor field-effect transistors (MESFETs) have the advantages of high electron mobility, fast carrier drift, large band gap, strong radiation resistance, and wide operating temperature range, and are widely used in optical fiber communications, mobile communications, Ultra-high-speed computers, high-speed measuring instruments, aerospace and other fields. With the continuous reduction of device feature size, especially after entering the deep submic...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L27/095H01L21/8252
Inventor 廖小平王凯悦
Owner SOUTHEAST UNIV