A Vertical Ionogram Inversion Method

An ionogram and inversion technology, which is used in electrical digital data processing, special data processing applications, instruments, etc., can solve the problems of large echo trace deviation, and achieve the effect of improving inversion accuracy and stability.

Inactive Publication Date: 2017-10-20
THE 22ND RES INST OF CHINA ELECTRONICS TECH GROUP CORP
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Problems solved by technology

The disadvantage of this method is that the valley parameters and the polynomial coefficients of the F layer profile are determined by directly using the data selected for inversion of the valley parameters, so that the vertical ionogram synthesized based on the inversion results and the measured ionogram The echo tracing deviation is larger in the higher area of ​​the F layer

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  • A Vertical Ionogram Inversion Method
  • A Vertical Ionogram Inversion Method
  • A Vertical Ionogram Inversion Method

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Embodiment 1

[0030] Example 1, such as figure 1 As shown, this embodiment discloses a vertical ionogram inversion method, including the following steps:

[0031] (1) Establish a mathematical model of the ionospheric profile:

[0032] The present invention is based on the idea of ​​the mode method, and the ionosphere is modeled as a three-layer model including the E layer, the valley layer and the F layer, the E layer and the valley layer sections are represented by a parabolic model, and the F layer section is represented by a shifted Chebyshev polynomial model Indicates that the ionospheric electron concentration profile has the form shown in formula (1):

[0033]

[0034] The connection point between the E layer and the valley layer is located at the peak height h of the E layer mE , the connection point between the valley layer and the F layer is at the height h 2 and at height h 2 The plasma frequency at is equal to the critical frequency f of the E layer CE , the valley layer ...

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Abstract

The invention discloses a vertical ionogram inversion method, comprising the following steps: step 1: establishing a mathematical model of the ionosphere profile, the model is a three-layer model including an E layer, a valley layer and an F layer; step 2: Calculation of the false height of the reflection echo of each layer, based on the established ionospheric model, deduce the calculation formula of the false height of the E layer and F layer; Step 3: Using the measured ionogram data, combined with the E layer, F layer echo false height The calculation results are used to invert the ionospheric parameters of the E layer, the valley layer and the F layer. The vertical measurement ionogram inversion method disclosed by the invention overcomes the shortcomings of the prior art, and proposes a vertical measurement ionogram inversion method based on the constraints of the shifted Chebyshev polynomial model to optimize the parameters of the F layer. After the layer parameters are determined, the echo trace data in the higher area of ​​the F layer is selected, and under the constraint of ensuring the continuous and smooth profile, the polynomial coefficient of the F layer profile is calculated, and the ionospheric profile is finally determined, which can effectively improve the inversion accuracy and stability.

Description

technical field [0001] The invention relates to the field of ionospheric research and application, in particular to a method for inverting ionospheric parameters by using a vertical ionogram. Background technique [0002] Using the vertical ionogram to invert the ionospheric profile (the correspondence between the height of the ionosphere and the plasma frequency or electron concentration) has been widely valued by people. At present, the vertical ionogram inversion methods can be summarized into the following two types: ① direct Calculation method, which directly uses the measured false height to calculate the real reflection height of the corresponding frequency (abbreviated as true height), mainly including slice method, single polynomial method, overlapping polynomial method, etc. Some of these methods are based on the establishment of true height and false height. Simultaneous equations, directly solve the true height based on the actual measured virtual height, such as...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G06F19/00
Inventor 蔚娜柳文冯静杨龙泉鲁转侠师燕娥郭文玲
Owner THE 22ND RES INST OF CHINA ELECTRONICS TECH GROUP CORP
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