Application of two-dimensional lysozyme nano-film as photoresist

A two-dimensional nano, lysozyme technology, applied in the field of photoresist, can solve the problems of high operation requirements, harmful waste liquid, complicated steps, etc., and achieve the effects of low roughness, good resistance and easy operation.

Active Publication Date: 2015-12-30
SHAANXI NORMAL UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The steps are quite cumbersome and the operation requirements are high, which undoubtedly leads to extremely high costs
In addition, traditional photoresists are not only inherently toxic, but often use more organic solvents in the developing and stripping steps, resulting in a large amount of waste liquid that is harmful to the environment

Method used

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  • Application of two-dimensional lysozyme nano-film as photoresist
  • Application of two-dimensional lysozyme nano-film as photoresist
  • Application of two-dimensional lysozyme nano-film as photoresist

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0021] The application of lysozyme two-dimensional nano-film as a photoresist is as follows:

[0022] Place the silicon dioxide wafer with in situ growth of lysozyme two-dimensional nano-film on the surface between the photomask and the ITO glass plate, and place it under a high-pressure mercury lamp with an ultraviolet wavelength of 254nm and a light intensity of 8000μw / cm 2 Take it out after irradiating for 6 minutes under the same conditions, and develop it with ultrapure water for 30 seconds, as shown in figure 1 As shown, the two-dimensional nano-film of lysozyme has been patterned, that is, a silicon dioxide sheet covered with a patterned two-dimensional nano-film of lysozyme has been obtained. Add 5mL of isopropanol and 5mL of HF into the airtight container, then suspend the silicon dioxide wafer covered with the patterned lysozyme two-dimensional nano-film in the airtight container, and etch at 30°C with HF steam for 30 minutes at a constant temperature, and the etch...

Embodiment 2

[0024] The application of lysozyme two-dimensional nano-film as a photoresist is as follows:

[0025] Place the copper-coated silicon chip with in-situ growth of lysozyme two-dimensional nano-film on the surface between the photomask and the ITO glass plate and fix it. Using the electron beam direct writing system, the acceleration voltage is 30kv, the electron beam spot is 3nm, and the electron beam The beam intensity is 3000μC / cm 2 Under the conditions of exposure, and then developed with ultrapure water for 30 seconds, such as Figure 4 As shown, the two-dimensional nanofilm of lysozyme has been patterned. Immerse the copper-plated silicon chip covered with the patterned lysozyme two-dimensional nano-film in 5mL aqueous solution containing 10mmol / L N-bromosuccinimide and 10mmol / L pyridine, etch at room temperature for 10 minutes, and then etched After the copper-plated silicon chip is placed in the mass fraction of 50% acetic acid aqueous solution for 10 minutes, the patt...

Embodiment 3

[0027] The application of lysozyme two-dimensional nano-film as a photoresist is as follows:

[0028] Place the copper-coated silicon wafer with in-situ growth of lysozyme two-dimensional nano-film on the surface between the photomask and the ITO glass plate, and place it under a high-pressure mercury lamp, with an ultraviolet wavelength of 254nm and a light intensity of 8000μw / cm 2 Take it out after irradiating for 6 minutes under the condition, and develop it with ultrapure water for 30 seconds, and the lysozyme two-dimensional nano film has been patterned. Immerse the copper-plated silicon chip covered with the patterned lysozyme two-dimensional nano-film in 5mL aqueous solution containing 10mmol / L N-bromosuccinimide and 10mmol / L pyridine, etch at room temperature for 10 minutes, and then etched After the copper-plated silicon chip is placed in the mass fraction of 50% acetic acid aqueous solution for 10 minutes, the patterned copper-plated silicon chip (such as Image 6...

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PUM

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Abstract

The invention discloses an application of a two-dimensional lysozyme nano-film as a photoresist. The two-dimensional lysozyme nano-film is taken as the photoresist, a component of the two-dimensional lysozyme nano-film is the natural biomolecule lysozyme capable of being widely acquired from nature, and environmental pollution caused by the traditional photoresist during manual synthesis is avoided; the two-dimensional lysozyme nano-film is higher in transparency and low in roughness, has controllable thickness and does not require tedious technologies such as coating, baking and the like, all that is required is to perform in-situ growth of the two-dimensional lysozyme nano-film on the surface of a substrate or directly adhere the prepared two-dimensional lysozyme nano-film to the surface of the substrate in a two-dimensional lysozyme nano-film preparation process, large-area preparation is easy to realize, further, the two-dimensional lysozyme nano-film has better ultraviolet and electron beam sensitiveness, can be exposed in ultraviolet and electron beam modes, is only required to be developed with water after exposure, is free of environmental pollution and has better developing effect; meanwhile, the two-dimensional lysozyme nano-film has good etching resistance, and can be subjected to photoresist removing by selecting a guanidine hydrochloride aqueous solution, an acetic acid aqueous solution and an oxalic acid aqueous solution after etching.

Description

technical field [0001] The invention belongs to the technical field of photoresist, and in particular relates to the application of lysozyme two-dimensional nano film as photoresist. Background technique [0002] Photoresist, also known as photoresist, is a medium for pattern transfer using photochemical reactions. Its technology is complex and there are many varieties. According to its chemical reaction mechanism and development principle, it can be divided into two types: negative-acting and positive-acting; based on the chemical structure of photosensitive resin, photoresist can be divided into three types: photopolymerization, photolysis and photocrosslinking; Depending on the light source or radiation source, it can be divided into ultraviolet photoresist, deep ultraviolet photoresist, electron beam glue, ion beam glue, X-ray glue, etc. Photoresist is mainly used in the microfabrication process of integrated circuits and semiconductor discrete devices in the electronic...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/004
Inventor 杨鹏王德辉哈媛李倩
Owner SHAANXI NORMAL UNIV
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