Polishing solution stirring device and method

Abstract

The invention provides a polishing solution stirring device comprising the following structures: a mixing tank used for containing polishing solution, and the bottom of the mixing tank is provided with a lower discharge port allowing liquid to flow; a magnetic stirring device comprising a magnetic stirrer fixed outside the mixing tank and a magnetic stirring rotor fixed in the mixing tank; a diaphragm pump with a liquid inlet connecting with the lower discharge port on the bottom of the mixing tank; a chemically mechanical polishing device connected with a liquid outlet of the diaphragm pump, and the mixed polishing solution in the mixing tank is conducted into the chemically mechanical polishing device through the diaphragm pump. The invention also provides a polishing solution stirring method; the method and device can prevent pollution caused by direct mechanical stirring, and can enhance polishing solution stirring effect.

Description

technical field [0001] The invention relates to an IC manufacturing process, in particular to a chemical mechanical polishing liquid supply system and a stirring method thereof. technical background [0002] Since chemical mechanical planarization (CMP) was introduced into the integrated circuit manufacturing process by IBM in 1990, it has continued to develop and has become one of the key integrated circuit processes to extend Moore's Law. In the chemical mechanical planarization process, the polishing fluid is an important consumable for the CMP process. According to the CMP requirements of different microstructures or different materials, different types of polishing fluids are required. [0003] How to ensure the stability of the CMP process is one of the points of concern. In addition to the need to pay attention to the CMP process itself, the auxiliary system to maintain the normal operation of the CMP process is also critical. The transmission of the polishing liqui...

AI Technical Summary

Problems solved by technology

The relationship between the liquid supply system and the CMP process equipment is shown in the flow chart figure 1 .Among them, the stirring rod of the mechanical motor must be soaked in the polishing liquid all the time. If it is used for a long time, it may bring mechanical oil pollution and other impurities to the polishing liquid.

Images