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Cooling and sealing device for mouth of decompression and diffusion furnace

A technology of sealing device and diffusion furnace, which is applied in the directions of diffusion/doping, crystal growth, and after treatment, which can solve the problems of lower yield, temperature field disturbance, heat loss, etc., reduce equipment operation and maintenance costs, and improve sealing The effect of improving reliability and sealing performance

Active Publication Date: 2016-05-04
48TH RES INST OF CHINA ELECTRONICS TECH GROUP CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At the same time, a large amount of heat is lost through conduction and radiation at the furnace mouth, which may cause disturbances in the temperature field at the furnace mouth, affecting the length and accuracy of the constant temperature zone of the reaction tube, resulting in a decrease in yield and an increase in energy consumption

Method used

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  • Cooling and sealing device for mouth of decompression and diffusion furnace
  • Cooling and sealing device for mouth of decompression and diffusion furnace
  • Cooling and sealing device for mouth of decompression and diffusion furnace

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Embodiment Construction

[0032] The present invention will be described in further detail below in conjunction with the accompanying drawings and specific embodiments.

[0033] Figure 1 to Figure 11 An embodiment of a cooling and sealing device for a decompression diffusion furnace mouth of the present invention is shown. A quartz furnace door 2 is installed at the mouth of a decompression diffusion furnace reaction tube 1, and a sealing ring 20 is installed on the inner end surface of the quartz furnace door 2. The quartz furnace The door 2 is in sealing contact with the inner end surface of the installation flange 10 of the nozzle of the reaction tube 1 through the sealing ring 20 . See details figure 1 and figure 2 , the periphery of the sealing ring 20 includes three areas, the area I is the outer circumference of the quartz furnace door 2 and the mounting flange 10, the area II is the outer end face of the mounting flange 10, and the area III is the outer end face of the quartz furnace door 2...

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Abstract

The invention discloses a cooling and sealing device for the mouth of a decompression and diffusion furnace. A quartz furnace door is mounted at the orifice of a reaction tube of the decompression and diffusion furnace; a sealing ring is installed on the inner end surface of the quartz furnace door; the quartz furnace door hermetically abuts against the inner end surface of a mounting flange located at the orifice of the reaction tube; the periphery of the sealing ring is provided with forced cooling devices used for local forced cooling of the sealing ring; and the forced cooling devices comprise air cooler assemblies used for local forced cooling of the outer peripheries of the quartz furnace door and the mounting flange and the outer end surface of the mounting flange, and metal furnace door assemblies used for forced cooling of the outer end surface of the quartz furnace door. The cooling and sealing device provided by the invention is advantaged in that the device is capable of slowing the aging speed of the sealing ring and improving sealing reliability in a reaction chamber.

Description

technical field [0001] The invention relates to the technical field of photovoltaic and semiconductor electronic components, in particular to a cooling and sealing device for a furnace mouth of a decompression diffusion furnace. Background technique [0002] Diffusion furnaces are widely used in the manufacture of power electronic devices, semiconductor devices and crystalline silicon solar cells. The PN junction is prepared by doping phosphorus or boron on the surface of silicon wafers. The preparation of PN junction is the core process of device and solar energy manufacturing, and its quality directly determines the quality of the product. [0003] With the development of the device manufacturing industry, especially the development of high conversion efficiency of crystalline silicon solar cells, the traditional atmospheric pressure diffusion process has been difficult to meet the process requirements of shallow junctions with high square resistance, and the doping unifor...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B31/06
CPCC30B31/06
Inventor 张宝锋禹庆荣苏卫中刘良玉杨彬
Owner 48TH RES INST OF CHINA ELECTRONICS TECH GROUP CORP