Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A method and device for optimizing optical system parameters

An optical system and parameter technology, applied in the field of optical measurement, can solve problems such as inability to select high sensitivity

Active Publication Date: 2018-06-26
RAINTREE SCI INSTR SHANGHAI
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the current optical system parameters are preset and fixed. In OCD measurement, it is not possible to flexibly select a measurement mode with high sensitivity and high signal-to-noise ratio for different structural parameters to be measured.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A method and device for optimizing optical system parameters
  • A method and device for optimizing optical system parameters
  • A method and device for optimizing optical system parameters

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0026] In order to illustrate the solution of the present invention more clearly, the OCD measurement principle is first described below:

[0027] The implementation steps of the OCD measurement principle may include:

[0028] 1) The OCD measurement equipment establishes a theoretical spectral database corresponding to the morphology of the structure to be measured.

[0029] The specific implementation of this step includes: first, the OCD measuring device establishes a structure model to be measured according to the shape of the structure to be measured; then, the OCD measuring device performs theoretical simulation on the structure model to be measured to obtain a theoretical spectrum of the structure to be measured; Then, the OCD measuring device establishes a theoretical spectrum database of the structure to be measured according to the theoretical spectrum of the structure to be measured obtained through simulation.

[0030] Wherein, the structure model to be tested can ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a scheme for optimizing a parameter of an optical system. According to the scheme, for each of a plurality of measuring modes, a system noise value corresponding to the measuring mode is determined; and for each structural parameter of a to-be-measured structural model, a controllable measurement precision value of the structural parameter in the measuring mode is determined, one or more selectable measuring modes of the structural parameter are determined according to a plurality of controllable measurement precision values of the structural parameter in the multiple measuring modes, the one or more controllable measurement precision values of the structural parameter in the one or more selectable measuring modes are used as the controllable measurement precision value corresponding to the structural parameter.

Description

technical field [0001] The invention relates to the technical field of optical measurement, in particular to a method and device for determining the controllable measurement accuracy of structural parameters in optical critical dimension OCD (Optical Critical Dimension) measurement in computer equipment. Background technique [0002] In the integrated circuit industry, it is mainly used in the system hardware part of the optical critical dimension OCD measurement equipment based on the scattering spectrum signal in the very large-scale integrated circuit manufacturing process. The main source of noise is the error of the optical system parameters of the OCD measurement equipment. That is, the difference between the theoretical design parameters and the actual assembled parameters. At present, the optical components of the hardware part of the OCD measurement equipment based on the scattering spectrum signal are usually fixed, so the parameters of the optical system are usual...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/00
Inventor 王鑫张振生施耀明徐益平
Owner RAINTREE SCI INSTR SHANGHAI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com