Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Secondary-etching double-sided circuit board structure and processing technique thereof

A double-sided circuit board, secondary etching technology, applied in printed circuits, printed circuit manufacturing, electrical components, etc., can solve the problems of uncontrolled product quality, long cycle cycle, large cost investment, etc., to simplify the production process The effect of operation difficulty, reduction of PCB production cost, and reduction of human resources investment

Active Publication Date: 2016-05-11
苏州市三生电子有限公司
View PDF6 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] In the current circuit board production process, double-sided circuit boards with GTL circuit layer, GBL internal circuit layer and GBL external circuit layer are all manufactured three times, and the circuit production is completed one by one. The cumulative error of production is very large, and the product quality is not good. When it comes to management and control, the operation cycle is long, the production cycle is long, the production delivery time cannot be improved, and the cost investment is also large, which cannot meet the customer's requirements; after the research, the operation can be completed in the second time, and the product quality can also be improved. be regulated

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Secondary-etching double-sided circuit board structure and processing technique thereof
  • Secondary-etching double-sided circuit board structure and processing technique thereof
  • Secondary-etching double-sided circuit board structure and processing technique thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0027] Below in conjunction with accompanying drawing and embodiment the present invention is described in further detail:

[0028] Such as image 3 As shown, a secondary etching double-sided circuit board structure includes: GTL line layer 1, insulating PP layer 2 and GBL step surface line layer, characterized in that: the GBL step surface line layer is composed of GBL inner line layer 3 and The GBL outer line layer 4 is formed, the insulating PP layer 2 is located between the GTL line layer 1 and the GBL inner line layer 3, the GBL outer line layer 4 is located on the other side of the GBL inner line layer 3, and the GBL outer line layer 4 is similar to the appearance shape of the GBL inner circuit layer 3, but the size B1 of the GBL inner circuit layer 3 is larger than the size B2 of the GBL outer circuit layer 4, and the size relationship is preferably: B1=B2+0.05mm. The production process of etching double-sided circuit boards includes the sub-process of the first circui...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a secondary-etching double-sided circuit board structure and a processing technique thereof. The secondary-etching double-sided circuit board structure comprises a GTL line layer, an insulating PP layer and a GBL stepped surface line layer. The GBL stepped surface line layer is formed by a GBL inner line layer and a GBL outer line layer; the insulating PP layer is arranged between the GTL line layer and the GBL inner line layer; and the GBL outer line layer is arranged on the other surface of the GBL inner line layer. In addition, The processing technique consists of a first line manufacturing process and a secondary line manufacturing process; the first line manufacturing process includes steps of first line graph manufacturing, line development cam compensation, line examination, and etching; and the secondary line manufacturing process includes steps of secondary line graph manufacturing, line development cam compensation, line examination, etching, and electric detection on an open circuit and a short circuit, and a post procedure. According to the invention, only two-times manufacturing is carried out; the investment is low; the production flow is simplified and the working difficulty is reduced; the production efficiency is improved; the production cost is lowered; the reject ratio is reduced; and the product production period is reduced.

Description

technical field [0001] The invention relates to a circuit board production process, in particular to a secondary etching double-sided circuit board production process. Background technique [0002] In the current circuit board production process, double-sided circuit boards with GTL circuit layer, GBL internal circuit layer and GBL external circuit layer are all manufactured three times, and the circuit production is completed one by one. The cumulative error of production is very large, and the product quality is not good. When it comes to management and control, the operation cycle is long, the production cycle is long, the production delivery time cannot be improved, and the cost investment is also large, which cannot meet the customer's requirements; after the research, the operation can be completed in the second time, and the product quality can also be improved. get regulated. In order to solve the above problems, a new type of superimposed circuit board circuit prod...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H05K3/00
Inventor 孙祥根
Owner 苏州市三生电子有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products