Pixel structure and fabricating method thereof
A technology of pixel structure and manufacturing method, used in semiconductor/solid-state device manufacturing, optics, instruments, etc., can solve the problems of reducing the aperture ratio of blue pixels and decreasing the color saturation, and achieve the best aperture ratio and color saturation. Effect of aperture ratio and area reduction
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0059] Figure 1A to Figure 1E It is a schematic top view of the process flow of the manufacturing method of the pixel structure according to an embodiment of the present invention, Figure 2A to Figure 2E for along Figure 1A to Figure 1E A schematic cross-sectional view of I-I', and Figure 3A to Figure 3E for along Figure 1A to Figure 1EThe schematic cross-section of II-II'. In particular, for the sake of clarity, three pixel areas are taken as an example in the drawings for illustration, but the present invention is not limited thereto. Please also refer to Figure 1A , Figure 2A as well as Figure 3A , firstly, a first gate line GL1, a second gate line GL2, a first gate GE1, a second gate GE2 and a connection line CL are formed on a substrate 102, wherein the first gate GE1 and the second gate GE2 are located on both sides of the connection line CL and between the first gate line GL1 and the second gate line GL2 . Specifically, a first conductor layer (not shown) i...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com