Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A half-selective interference cancellation structure for sram based on hierarchical bit line structure

A technology of hierarchical bit line and interference elimination, applied in information storage, static memory, digital memory information, etc., can solve the problems affecting the power consumption and robustness of SRAM circuits, and achieve non-ideal effects, eliminate short-circuit discharge paths, reduce Effects of interference and robustness improvement

Active Publication Date: 2018-07-17
XI AN JIAOTONG UNIV
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] As mentioned above, although researchers have proposed a variety of novel solutions from different perspectives, most of them are not ideal, and the semi-selection problem is still unresolved, which still seriously affects the power consumption and robustness of SRAM circuits.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A half-selective interference cancellation structure for sram based on hierarchical bit line structure
  • A half-selective interference cancellation structure for sram based on hierarchical bit line structure
  • A half-selective interference cancellation structure for sram based on hierarchical bit line structure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0029] A kind of SRAM semi-selective elimination structure based on the hierarchical bit line structure of the present invention adopts the combination of local bit line suspension and virtual ground wire control technology; the present invention adopts 8T-SRAM unit, and according to the size of the SRAM array scale, each row of units Reasonable division into several sub-modules (each sub-module includes 8-64 memory cells) to reduce the parasitic capacitance of the bit line, thereby reducing the power consumption during read and write operations. The semi-selection interference phenomenon comes from the existence of the static discharge path of the pre-charged bit line-access transistor-pull-down transistor. For read operations, such as figure 2 As shown, the ground wires of the reading branches of each memory unit in the sub-module are separately led out, and connected to the actual ground wire through the ground wire control switch, and the column selection signal Col of...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a static random access memory (SRAM) half-select disturb elimination structure based on a hierarchical bit line structure. The SRAM half-select disturb elimination structure based on the hierarchical bit line structure comprises a storage array which has the hierarchical bit line structure; each storage unit of the storage array has a single reading operation branch; each column of the storage array is divided into a plurality of sub-modules. According to the SRAM half-select disturb elimination structure based on the hierarchical bit line structure, by utilizing virtual ground wire control, a ground wire of the reading operation branch of each storage unit in each sub-module is singly guided out, and is uniformly connected with an actual ground wire through a ground wire control switch; additionally, column selection signals Col of a corresponding column of each sub-module control a conduction state of each ground wire control switch, and a bit line discharge path of an unselected column unit during a reading operation is switched off, so that static power consumption caused by half select disturb is completely eliminated; however, due to utilization of a local bit line suspension technology, unselected column is forced to locally suspend in a writing operation, so that a short circuit discharge path is eliminated; meanwhile, the disturbance of local bit lines to a half-select unit is effectively reduced, so that unit robustness is improved, and noise margin is increased.

Description

technical field [0001] The invention relates to the technical field of semiconductor integrated circuits, in particular to an SRAM (Static Random Access Memory, static random access memory) semi-selective interference elimination structure. Background technique [0002] With the development of technology and the change of lifestyle, people's demand for health aids such as implanted biochips and wearable devices is increasing. Most of these devices are powered by batteries, and in order to prolong their service life, the internal memory SRAM is required to be able to operate with lower power consumption. However, since the storage arrays are mostly arranged using the interleaving rule, serious half-selection interference problems will occur when the SRAM is working. Such as figure 1 As shown, during the read and write operations, the unselected cells are disturbed by the precharge level of the bit line, and the voltage of the storage node Q rises, which not only leads to se...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G11C11/412
CPCG11C11/412
Inventor 耿莉张杰薛仲明董力商中夏李广林
Owner XI AN JIAOTONG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products