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Anti-shock structure for chemical vapor deposition device

A technology of chemical vapor deposition and anti-shock, which is applied in the direction of gaseous chemical plating, metal material coating process, coating, etc., can solve the problems that abnormalities cannot be found in time, increase maintenance content, increase production costs, etc., and achieve simplified maintenance Maintenance process, simple structure, and the effect of reducing production costs

Active Publication Date: 2018-04-13
CSMC TECH FAB2 CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This measure has the following disadvantages: 1. Increased maintenance content, which affects maintenance efficiency; 2. Replacement of spare parts increases production costs; 3. Unable to detect sudden abnormalities in time

Method used

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  • Anti-shock structure for chemical vapor deposition device
  • Anti-shock structure for chemical vapor deposition device

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Embodiment Construction

[0015] In order to make the above objects, features and advantages of the present invention more comprehensible, the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0016] Such as figure 2 As shown, the present invention is an anti-shock structure for a chemical vapor deposition device.

[0017] The chemical vapor deposition device includes a heating unit 7 and a control unit, the control unit controls the operation of the chemical vapor deposition device, and the control unit is a prior art, figure 2 not shown in The heating component 7 is connected to an AC circuit 8 , and the AC circuit 8 supplies power to the heating component 7 . An RF ground wire 12 is also installed on the heating component 7 to ground the RF signal.

[0018] In the present invention, a thermal sensor 11 is arranged on the wire of the AC circuit 8 of the heating component 7, and the thermal sensor 11 is connected ...

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PUM

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Abstract

The invention relates to an anti-shock structure for a chemical vapor deposition device, the chemical vapor deposition device includes a control unit and a heating component grounded through an RF grounding wire, the heating component is connected to an AC circuit, and the control unit has In the interlocking circuit, the AC circuit is equipped with a thermal sensor, and the thermal sensor is also connected to the internal interlocking circuit. After the RF grounding wire is disconnected, the RF signal enters the AC circuit and causes the AC circuit to The temperature changes, and the thermal sensor controls the on-off of the internal interlocking circuit according to the temperature change. The invention adopts thermal sensor to sense the thermal signal generated by the AC loop wire when the RF grounding wire is abnormal, and controls the chemical vapor deposition device through the internal interlocking loop. The structure is simple, and the fault of the RF grounding wire can be found in time; The maintenance and repair process of the vapor deposition device reduces the production cost and improves the maintenance efficiency.

Description

technical field [0001] The invention relates to a chemical vapor deposition device, in particular to an anti-shock structure for the chemical vapor deposition device. Background technique [0002] Chemical Vapor Deposition (CVD, Chemical Vapor Deposition) refers to the process of introducing the gaseous reactant or liquid reactant vapor containing the film elements and other gases required for the reaction into the reaction chamber, and a chemical reaction occurs on the surface of the substrate to form a film. In VLSI, many thin films are prepared by CVD. [0003] Such as figure 1 As shown, it is a chemical vapor deposition device that realizes the generation reaction of SiO2 by radio frequency (RF). When the RF is generated by the radio frequency generator 1 and reaches the heating part 7 through the matching network 2, the distribution network 3 and the nozzle 5, it will be grounded from the capacitor 9 through a wire connected to the heating part 7, and the serial numbe...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/44
Inventor 吴浩
Owner CSMC TECH FAB2 CO LTD