Cleaning device and clearing method for wet-type etching machine table
A cleaning device and etching technology, which is applied in the direction of electrical components, semiconductor/solid-state device manufacturing, circuits, etc., can solve problems such as uneven brightness of liquid crystal displays
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Embodiment 1
[0037] Please refer to figure 1 , figure 1 It is a schematic diagram of the overall device of a cleaning device of a wet etching machine in this embodiment, from figure 1 It can be seen that a cleaning device for a wet etching machine of the present invention includes:
[0038] The chemical tank 10 is used to contain the chemical solution 80 for etching the glass substrate 70 .
[0039] The water washing tank 20 is used for cleaning the glass substrate 70 etched by the chemical solution 80 .
[0040] The baffle 30 is vertically arranged between the chemical tank 10 and the top of the washing tank 20, and is used to isolate the chemical tank 10 from the washing tank 20, so as to prevent the chemical solution 80 from contaminating the Wash tank 20.
[0041] The substrate conveying channel 60 is located below the baffle plate 30, and it is conveyed by a conveyor belt driven by rollers, and is used to connect the chemical tank 10 and the washing tank 20, and multiple glass sub...
Embodiment 2
[0049] Please refer to figure 1 and figure 2 , figure 1 It is a schematic diagram of the overall device of a cleaning device of a wet etching machine in this embodiment, figure 2 It is a schematic cross-sectional view of the overall structure of a cleaning device for a wet etching machine in this embodiment, from figure 1 and figure 2 It can be seen that a cleaning device for a wet etching machine of the present invention includes:
[0050] A cleaning device for a wet etching machine, comprising:
[0051] The chemical tank 10 is used to contain the chemical solution 80 for etching the glass substrate 70;
[0052] The water washing tank 20 is used for cleaning the glass substrate 70 etched by the chemical solution 80 .
[0053] The baffle 30 is vertically arranged between the chemical tank 10 and the top of the washing tank 20, and is used to isolate the chemical tank 10 from the washing tank 20, so as to prevent the chemical solution 80 from contaminating the Wash ta...
Embodiment 3
[0060] Please refer to image 3 , image 3 It is a schematic diagram of implementation steps of a cleaning method for a wet etching machine in this embodiment, the wet etching machine is the cleaning device described in Embodiment 1, from image 3 It can be seen that a cleaning method of a wet etching machine of the present invention comprises the following steps:
[0061] Step S101 : the sensor 50 detects the positions of multiple glass substrates 70 at even intervals in the substrate conveying channel 60 in real time.
[0062] Step S102 : When it is detected that the first glass substrate 70 reaches the preset position, the substrate conveying channel 60 stops rotating, and the vibrating motor 40 starts to vibrate the baffle 30 .
[0063] Step S103 : after the vibration of the baffle 30 is finished, the substrate conveying channel 60 continues to convey the first piece of the glass substrate 70 through the baffle 30 .
[0064] Step S104: Subsequent pieces of the glass sub...
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