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Processing method of layout data

A processing method and technology of layout data, applied in the field of layout data processing and photomask data, can solve problems such as no solution, increased processing time, redundant graphics take a long time, etc., to ensure safety and reduce The effect of time spent

Active Publication Date: 2020-02-14
SEMICON MFG INT (SHANGHAI) CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, in the above processing method, the insertion of redundant graphics takes a long time, thereby increasing the time of the entire processing process; moreover, directly inserting redundant graphics into the chip data needs to modify the chip data provided by the customer, which will increase damage to the customer. chip data provided
For the above problems, there is currently no effective solution

Method used

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  • Processing method of layout data

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Embodiment Construction

[0019] It should be noted that, in the case of no conflict, the embodiments in the present application and the features in the embodiments can be combined with each other. The present application will be described in detail below with reference to the accompanying drawings and embodiments.

[0020] It should be noted that the terminology used here is only for describing specific implementations, and is not intended to limit the exemplary implementations according to the present application. As used herein, unless the context clearly dictates otherwise, the singular is intended to include the plural, and it should also be understood that when the terms "comprising" and / or "comprising" are used in this specification, they mean There are features, steps, operations, means, components and / or combinations thereof.

[0021] For the convenience of description, spatially relative terms may be used here, such as "on ...", "over ...", "on the surface of ...", "above", etc., to describe...

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Abstract

The invention discloses a layout data processing method and photomask data. The processing method comprises the following steps: when redundant graphic data is merged into chip data, carrying out optical proximity correction on graphs in the chip data so as to form middle data; and converting the middle data into photomask data. According to the processing method, optical proximity correction is carried out on the graphs in the chip data when the redundant graphic data is merged into the chip data, so that the time consumed by the layout data processing method is shortened; and the chip data provided by the users is not modified in the process of merging the redundant graphic data into the chip data, so that the safety of the chip data provided by the users is ensured.

Description

technical field [0001] The present application relates to the technical field of semiconductor integrated circuits, and in particular, relates to a layout data processing method and photomask data. Background technique [0002] In the manufacturing process of semiconductor products, part of it is the process that manufacturers process the layout data provided by customers to obtain photomask data, and then use the photomask data to manufacture photomasks. This part is a key part of the process connection, the most expensive part of the process, and one of the bottlenecks that restricts the minimum line width. [0003] The processing method of the existing layout data generally includes the following steps: first, use a redundant pattern insertion tool to modify the chip data provided by the customer, so as to insert redundant patterns (dummy) around the pattern in the chip data; then, use the design rule check (DRC) tool performs graphic correction to verify whether the red...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G06F30/398
Inventor 王刚游桂美
Owner SEMICON MFG INT (SHANGHAI) CORP