Reproduction method of masked peaks based on optimization of test system
A systematic, multi-objective optimization technology, applied in the direction of testing metals, chemical process analysis/design, special data processing applications, etc., can solve problems such as difficult detection of low-concentration ions
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[0037] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are the Some, but not all, embodiments are invented. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0038] see figure 1 , this embodiment discloses a masking peak reappearance method based on test system optimization, including:
[0039] S1. Construct the two objectives of optimizing the test system based on the defined two indicators that affect the masking peak reappearance, design experiments and obtain experimental data, and analyze the statistical characteristic...
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