The invention provides a photoetching
process window calculation optimization method,
system and terminal, and the method comprises the steps: firstly calculating a standard EPE value range of a current position segmentation
line segment, and defining optimization targets of various key fault mode functions; then selecting a plurality of initial process condition points to carry out photoetching
simulation, obtaining real EPE values of all key fault
modes of each point, and constructing a
data set; training a multi-task
Gaussian process agent model based on the
data set, re-training the model after Bayesian mixed acquisition function calculation and
data set updating, and repeatedly iterating until a termination condition is met to obtain a final agent model; and searching a prediction extreme value through the final model, and comparing the prediction extreme value with a standard EPE range to determine a final EPE value range. According to the method, the multi-
target acquisition function is weighted and fused into a single-target
optimization problem, so that the calculation complexity is greatly reduced, and the
verification time is remarkably shortened; in addition, by adjusting weight parameters, a key fault mode which has a greater influence on the actual photoetching summary yield can be inclined, optimization of calculation process resources is guided, and the overall calculation efficiency is improved.