A Cyclotron Injection Beam Deflection Plate and Central Area Device

A technology of cyclotron and deflection plate, which is applied in the direction of magnetic resonance accelerator, accelerator, electrical components, etc., can solve the problem that the central area cannot work stably, and achieve the effect of preventing bombardment of the deflection plate and avoiding pollution

Active Publication Date: 2019-03-29
CHINA INSTITUTE OF ATOMIC ENERGY
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  • Summary
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Problems solved by technology

[0004] The purpose of the present invention is to solve the problem that the central region cannot work stably due to the beam loss in the process of beam injection deflection and acceleration in the central region of the cyclotron injecting beam axially, and to provide a stable and reliable cyclotron Injection beam deflection plate and central area device of accelerator

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  • A Cyclotron Injection Beam Deflection Plate and Central Area Device
  • A Cyclotron Injection Beam Deflection Plate and Central Area Device

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Embodiment Construction

[0015] The present invention will be described in detail below in conjunction with the accompanying drawings and embodiments.

[0016] A cyclotron injection deflection plate and central area device, the main components are as figure 1 As shown, it mainly consists of a primary beam stop 1, a secondary beam stop 2, a spiral deflection plate 3, a lower electrode support 4 of the deflection plate, a central flange 5, an upper electrode support 6 of the deflection plate, and a high voltage An insulating upper protective cover 7, a high-voltage insulating ceramic column 8, a high-voltage insulating lower protective cover 9, and a high-voltage supporting seat 10 are composed.

[0017] The spiral deflecting plate 3 is arranged in the middle of the flange 5 in the central area, and the spiral deflecting plate 3 and its supporting parts are fixed on the flange 5 in the central area through a high-voltage insulating ceramic column 8 . Such as figure 2 As shown, the spiral deflection p...

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Abstract

The invention belongs to a cyclotron design technology, and specifically relates to a cyclotron injected beam current deflection plate and center device. The device comprises a center flange plate, a spiral deflection plate is arranged in the middle of the center flange plate, the spiral deflection plate and a supporting component thereof are fixed on the center flange plate via high-voltage insulated ceramic posts, a beam current diaphragm for preventing stray beam current from bombarding the spiral deflection plate is arranged above the spiral deflection plate, and a high-voltage insulated protective cover is arranged outside each high-voltage insulated ceramic post. The device has the advantages that vertically injected beam current can deflect to a horizontal acceleration track via the spiral deflection plate, and the stray beam current is prevented from bombarding the deflection plate via the protection of the secondary beam current diaphragm, so that the center works stably.

Description

technical field [0001] The invention belongs to the cyclotron design technology, in particular to a cyclotron injection beam deflection plate and a central area device. Background technique [0002] The compact medium-energy high-current cyclotron is one of the main development directions of cyclotrons in recent years. This kind of cyclotron generally adopts an external ion source installed in the axial direction, and deflects the vertically injected beam into the horizontal direction through the spiral deflection plate device. In the central area, the beam enters the accelerator orbit after the acceleration phase is matched in the central area. It is injected into the deflection plate and the central area, which is one of the key devices that determine the performance index of the compact high-current cyclotron. At present, there are mainly two types of cyclotrons used for the production of medical radioisotopes. The first type is low-energy small cyclotrons for the product...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H05H13/00H05H7/00
CPCH05H7/001H05H13/00H05H2007/002
Inventor 张天爵吕银龙姚红娟宋国芳
Owner CHINA INSTITUTE OF ATOMIC ENERGY
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