A plain weave silk mask cloth

Abstract

The invention discloses a plain weave silk facial mask cloth. The real silk facial mask cloth is a plain weave structure formed by interlacing warp threads and weft threads woven with natural silk as raw material. The grammage of the real silk facial mask cloth is 8 ~16m / m, the width of the silk mask cloth is 115cm, the warp density is 50 threads / cm, and the weft density is 44 threads / cm. Due to the difference in water absorption between non-woven fabrics, cotton cloth and silk, the coefficients of expansion after water absorption are also different. Therefore, the present invention satisfies the air permeability of the mask cloth by optimizing the momme and density of the warp and weft on the base layer of the mask cloth. It is beneficial to increase the moisturizing performance of the mask cloth, better ensure the absorption effect of the skin, and the effect is more significant; the whole production process does not add any preservatives, which is friendly to the skin and non-irritating.

Description

technical field [0001] The invention relates to a skin care product, in particular to a plain weave silk mask cloth. Background technique [0002] The mask mainly uses the short time covered on the face to temporarily isolate the outside air and pollution, increase the temperature of the skin, expand the pores of the skin, promote the secretion and metabolism of sweat glands, increase the oxygen content of the skin, and help the skin to eliminate the metabolism of epidermal cells. The products and accumulated oils, the moisture and nutrients in the mask penetrate into the stratum corneum of the epidermis, the skin becomes soft, and the skin is naturally bright and elastic. In order to prevent the growth of microorganisms, preservatives are often added to the mask. However, long-term use of preservatives or excessive preservatives in the mask will irritate the skin, cause skin allergies, dermatitis and other problems, and even accelerate skin aging and cause skin cells to bec...

AI Technical Summary

Problems solved by technology

[0003] The technical problem to be solved by the present invention is that the addition of chemical reagents such as preservatives in the facial mask may cause adverse effects such as skin irritation and dermatitis. The purpose is to provide a plain weave silk mask cloth without any chemical reagents such as preservatives, and has good skin care effect

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