A plain weave silk mask cloth

A technology of silk mask and plain weave, applied in the direction of textile, fabric, textile and paper making, can solve skin irritation and other problems, and achieve the effect of increasing moisturizing, stable structure and uniform distribution of nutrients

Inactive Publication Date: 2019-12-03
桐乡市都灵织造股份有限公司
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The technical problem to be solved by the present invention is that the addition of chemical reagents such as preservatives in the facial mask may cause adverse effects such as skin irritation and dermatitis. The purpose is to provide a plain weave silk mask cloth without any chemical reagents such as preservatives, and has good skin care effect

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A plain weave silk mask cloth
  • A plain weave silk mask cloth
  • A plain weave silk mask cloth

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0050] A facial mask based on plain weave silk facial mask cloth, said real silk facial mask cloth is a plain weave structure formed by interlacing warp threads and weft threads woven by adopting natural silk as raw material, and the grammage of the real silk facial mask cloth is 8m / m. The width of the silk mask cloth is 115cm, the warp density is 50 threads / cm, and the weft density is 44 threads / cm. The weaving process of silk mask cloth is the steps listed in sequence: white factory silk inspection → soaking → drying → winding → paralleling → shaping → weft winding → warping → knotting → weaving → degumming. Among them, the finished silk mask cloth is placed in the dyeing vat for degumming treatment step, using a trypsin solution with a concentration of 5g / L and a sodium bicarbonate solution with a concentration of 0.6g / L for degumming at a temperature of 50°C Processing 4h.

[0051] The steps of applying the glutinous rice liquid on the mask cloth to make a mask are:

[0...

Embodiment 2

[0058] A kind of facial mask based on plain weave silk mask cloth adopts the method of embodiment 1 to manufacture the real silk mask product, the difference is that the grammage of the real silk mask cloth is 10m / m.

Embodiment 3

[0060] A kind of facial mask based on plain weave silk mask cloth adopts the method of embodiment 1 to manufacture the real silk mask product, the difference is that the grammage of the real silk mask cloth is 12m / m.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
widthaaaaaaaaaa
Login to view more

Abstract

The invention discloses a plain weave silk facial mask cloth. The real silk facial mask cloth is a plain weave structure formed by interlacing warp threads and weft threads woven with natural silk as raw material. The grammage of the real silk facial mask cloth is 8 ~16m / m, the width of the silk mask cloth is 115cm, the warp density is 50 threads / cm, and the weft density is 44 threads / cm. Due to the difference in water absorption between non-woven fabrics, cotton cloth and silk, the coefficients of expansion after water absorption are also different. Therefore, the present invention satisfies the air permeability of the mask cloth by optimizing the momme and density of the warp and weft on the base layer of the mask cloth. It is beneficial to increase the moisturizing performance of the mask cloth, better ensure the absorption effect of the skin, and the effect is more significant; the whole production process does not add any preservatives, which is friendly to the skin and non-irritating.

Description

technical field [0001] The invention relates to a skin care product, in particular to a plain weave silk mask cloth. Background technique [0002] The mask mainly uses the short time covered on the face to temporarily isolate the outside air and pollution, increase the temperature of the skin, expand the pores of the skin, promote the secretion and metabolism of sweat glands, increase the oxygen content of the skin, and help the skin to eliminate the metabolism of epidermal cells. The products and accumulated oils, the moisture and nutrients in the mask penetrate into the stratum corneum of the epidermis, the skin becomes soft, and the skin is naturally bright and elastic. In order to prevent the growth of microorganisms, preservatives are often added to the mask. However, long-term use of preservatives or excessive preservatives in the mask will irritate the skin, cause skin allergies, dermatitis and other problems, and even accelerate skin aging and cause skin cells to bec...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): D06N3/00D03D15/00D03D13/00D01C3/02A61K8/97D03D15/233
CPCA61K8/97D01C3/02D03D13/008D03D15/00D06N3/00D10B2211/04
Inventor 朱利容龙雨霞
Owner 桐乡市都灵织造股份有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products