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Acid cyanide-free cadmium plating additive, plating solution preparation and electroplating process

A cyanide cadmium plating and additive technology is applied in the field of plating solution preparation and electroplating process, and acid cyanide-free cadmium plating additives, which can solve the problems of difficult treatment of electroplating wastewater, poor cyanide-free cadmium plating solution and plating quality, etc. The effect of improving the plating ability, improving the throwing ability, improving the flexibility and corrosion resistance

Active Publication Date: 2018-06-29
GUANGZHOU ULTRA UNION CHEM LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0012] The purpose of this invention is to propose acidic cyanide-free cadmium plating additives, preparation of plating solution and electroplating process, to solve the problems such as poor quality of current cyanide-free cadmium plating plating solution and plating layer and difficult treatment of electroplating wastewater

Method used

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Examples

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Comparison scheme
Effect test

Embodiment 1

[0034] The composition and concentration of the acidic cyanide-free rack plating cadmium plating solution of the present embodiment are as follows:

[0035] Cadmium chloride 37g / L, potassium chloride 160g / L, complexing agent 140g / L, brightener 2mL / L, auxiliary agent 30mL / L;

[0036] The operating conditions during electroplating are as follows:

[0037] The temperature of the plating tank is 15-35°C, and the cathode current density is 0.5-1.5A / dm 2 , the ratio of the area of ​​the cathode to the anode is 2:1, the anode is a cadmium plate with a cadmium content ≥ 99.97% and a high-density graphite plate for electroplating, and the area ratio of the cadmium plate to the graphite plate is 1:1 to 1:2.

[0038] The complexing agent is composed of three components A, B and C, wherein component A is nitrilotriacetic acid, component B is composed of any one or two of citric acid, tartaric acid, gluconic acid and malic acid, Component C is composed of any one or two of malonic acid, ...

Embodiment 2

[0054] The composition and concentration of the acidic cyanide-free barrel plating cadmium plating solution of the present embodiment are as follows:

[0055] Cadmium chloride 34g / L, potassium chloride 180g / L, complexing agent 150g / L, brightener 2mL / L, auxiliary agent 30mL / L;

[0056] The operating conditions during electroplating are as follows:

[0057] The temperature of the plating tank is 15-35°C, the voltage of the plating tank is 4-7V, the rotating speed of the drum is 3-5r / min, the ratio of the area of ​​the cathode to the anode is 2:1, and the anode is a cadmium plate with a cadmium content ≥ 99.97% + electroplating A high-density graphite plate is used, and the area ratio of the cadmium plate to the graphite plate is 1:1-1:2.

[0058] The preparation method of the complexing agent, brightener and auxiliary agent is the same as in Example 1.

[0059] Described acidic cyanide-free cadmium plating solution is prepared by following method:

[0060] (a) Add 4 / 5 water t...

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Abstract

The invention discloses an acid non-cyanide cadmium-plating additive, preparation of a plating solution and an electro-plating process. The plating solution comprises the following components: 35-40 g / L of cadmium chloride, 140-180 g / L of potassium chloride, 120-160 g / L of a complexing agent, 1.5-2.5 mL / L of a brightener, and 25-35 mL / L of an auxiliary agent. Electro-plating operation conditions comprise that the plating bath temperature is 15-35 DEG C, the negative electrode current density is 0.5-1.5 A / dm<2>, the area ratio of a negative electrode to a positive electrode is 2 to 1, and the positive electrode comprises two materials of a cadmium plate and an electro-plating high-density graphite plate. The advantages mainly comprise that a brightener and an auxiliary agent are prepared by adopting a high-performance electro-plating additive intermediate, the combined complexing agent and cadmium ions are used for generating polybasic complex ions, and the performance of the plating solution and the performance of a plating layer are improved; the plating solution of the process is stable and is easy to maintain, the current efficiency is relatively high, the deep plating ability is strong, the brittleness of the plating layer is small, the corrosion resistance is good, various properties meet requirements of the Ministry of Astronautics Industry standards QJ 453-1988 ''cadmium plating layer technology conditions'', and electroplating wastewater treatment results meet requirements of GB 21900-2008 ''electroplating pollutant discharge standards'' table 3.

Description

technical field [0001] The invention relates to the field of electroplating, in particular to an acidic cyanide-free cadmium plating additive, preparation of a plating solution and an electroplating process. Background technique [0002] Cadmium plating has excellent corrosion resistance and softness, and has been widely used. Cadmium and its compounds have certain toxicity. At the end of the 20th century, the cadmium plating process has been basically eliminated in the electroplating of civilian products. However, due to the special requirements of aerospace, navigation and some electronic products, some enterprises still retain a certain amount of cadmium plating process. . The traditional cyanide cadmium plating solution and product quality are stable, but cyanide is one of the pollutants strictly prohibited by the state. It is imperative to replace cyanide cadmium plating with cyanide-free cadmium plating, and time is pressing. my country has conducted some research on...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C25D3/26
CPCC25D3/26
Inventor 郭崇武赖奂汶
Owner GUANGZHOU ULTRA UNION CHEM LTD
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