A device for removing d-fructose in d-psicose
A technique of psicose and fructose, which is applied in the field of light industrial equipment manufacturing, can solve the problem of high cost, achieve the effects of reducing production cost, realizing mass production, and solving pH value adjustment
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0025] Example 1 Separation device for D-fructose and D-psicose
[0026] Such as figure 1 shown.
[0027] The device for removing D-fructose in D-psicose consists of an isomerization system 1, an oxidation system 2, a separation system 3, a storage tank 4 and a collection tank 5, wherein the isomerization system, oxidation system The separation systems are sequentially connected by liquid delivery pipes to form a circulation system;
[0028] in:
[0029] The isomerization system is made of glass and is a columnar container with a jacket layer. The container wrapped by the jacket layer is a reaction container 6 filled with solid glucose isomerase. The container is provided with a sample inlet 8 and an outlet. The sample port 9, its sample outlet is connected to the sample inlet 12 of the oxidation system by the delivery pipeline that is connected with the liquid delivery pump 19, and the interlayer of the coat layer is filled with circulating water, the circulating water sys...
Embodiment 2
[0030] Example 2 Using the device described in Example 1 to realize the removal of D-fructose in D-psicose
[0031] (1) Pretreatment of basic anion exchange resin: treatment method refers to GB5476-85 People's Republic of China national standard ion exchange resin pretreatment method;
[0032] ①Put the resin into a chromatographic column with an inner diameter of 3cm, and the height of the column bed is 30cm, and wash it repeatedly with pure water until there are no visible mechanical impurities in the sample and the water is clear;
[0033] ② Use 100mL 1N hydrochloric acid solution, 200mL pure water, 100mL 1N sodium hydroxide solution and 200mL pure water to pass through the resin layer from top to bottom. When using the reagent, make the liquid level 1cm higher than the resin layer to ensure that there are no air bubbles in the resin layer; this operation is performed twice;
[0034] ③The resin treated by ② is passed through the resin layer with 400mL 1N sodium hydroxide so...
Embodiment 3
[0043] Example 3 Crystallization of D-psicose
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 

