Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Packaging-free high-luminance LED chip structure and manufacturing method therefor

A technology of LED chip and LED structure, which is applied in the direction of electrical components, circuits, semiconductor devices, etc., can solve the problems of large leakage rate of flip chip structure, increase of production cost, increase of process steps, etc., to save packaging process and reduce leakage rate , good transmittance effect

Active Publication Date: 2017-03-22
SHANGHAI XINYUANJI SEMICON TECH
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In view of the shortcomings of the prior art described above, the purpose of the present invention is to provide a package-free high-brightness LED chip structure and its manufacturing method, which are used to solve the problem of the flip-chip structure in the prior art due to the use of back light. The problem of low light extraction efficiency; the large growth stress in the epitaxial layer due to the lack of peeling off the growth substrate, which makes the flip chip structure have a large leakage rate; and the process steps caused by the need for additional packaging processes increase, the problem of increased production costs

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Packaging-free high-luminance LED chip structure and manufacturing method therefor
  • Packaging-free high-luminance LED chip structure and manufacturing method therefor
  • Packaging-free high-luminance LED chip structure and manufacturing method therefor

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0064] see figure 1 , the present invention provides a package-free high-brightness LED chip structure. The present invention provides a package-free high-brightness LED chip structure. The package-free high-brightness LED chip structure includes: a GaN-based LED structure and a transparent substrate 3; The GaN-based LED structure includes a reflector 10, an N-type GaN layer 11, a light-emitting layer 12, a P-type GaN layer 13, a transparent electrode 14, a P electrode 15, an N electrode 16, and a P electrode lead-out electrode 17; the reflector 10, the The N-type GaN layer 11, the light-emitting layer 12, the P-type GaN layer 13, and the transparent electrode 14 are sequentially stacked from bottom to top; the side of the GaN-based LED structure away from the reflector 10 is a P-side The P electrode 15 runs through the transparent electrode 14 and is in contact with the P-type GaN layer 13, that is, one end of the P electrode is located on the surface of the P-type GaN layer ...

Embodiment 2

[0072] see figure 2 , this embodiment also provides a package-free high-brightness LED chip structure, the package-free high-brightness LED chip structure includes: a GaN-based LED structure and a transparent substrate 3; the GaN-based LED structure includes a reflector 10, an N-type GaN layer 11, light-emitting layer 12, P-type GaN layer 13, transparent electrode 14, P-electrode 15, N-electrode 16, and P-electrode lead-out electrode 17; the mirror 10, the N-type GaN layer 11, the light-emitting layer 12. The P-type GaN layer 13 and the transparent electrode 14 are stacked sequentially from bottom to top; the side of the GaN-based LED structure away from the reflector is the P surface; the P electrode 15 runs through the transparent electrode 14 And it is in contact with the P-type GaN layer 13, that is, one end surface of the P-type electrode is located on the surface of the P-type GaN layer 13, and the other end extends through the transparent electrode 14 to above the tran...

Embodiment 3

[0079] see image 3 , the present invention also provides a method for manufacturing a package-free high-brightness LED chip structure, the method is suitable for preparing the package-free high-brightness LED chip structure in Example 1, and the method includes the following steps:

[0080] 1) Provide a growth substrate;

[0081] 2) sequentially growing an N-type GaN layer, a light-emitting layer and a P-type GaN layer on the surface of the growth substrate;

[0082] 3) removing part of the P-type GaN layer and part of the light-emitting layer to expose the N-type GaN layer; forming an N electrode on the exposed surface of the N-type GaN layer, and forming an N electrode on the surface of the P-type GaN layer forming a P electrode and a transparent electrode, and the P electrode penetrates the transparent electrode up and down;

[0083] 4) providing a transparent substrate, bonding the transparent substrate to the structure obtained in step 3), the side opposite to the grow...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a packaging-free high-luminance LED chip structure and a manufacturing method therefor. The packaging-free high-luminance LED chip structure comprises a GaN-based LED structure and a transparent substrate, wherein the GaN-based LED structure comprises a reflecting mirror, an N type GaN layer, a light-emitting layer, a P type GaN layer, a transparent electrode, a P electrode, an N electrode and a P electrode extraction electrode; the reflecting mirror, the N type GaN layer, the light-emitting layer, the P type GaN layer and the transparent electrode are stacked from the bottom up in sequence; one surface, far from the reflecting mirror, of the GaN-based LED structure is a P surface; the P electrode runs through the transparent electrode and is in contact connection with the P type GaN layer; the N electrode is positioned on the surface of the N type GaN layer or on the surface of the reflecting mirror; one end of the P electrode extraction electrode is connected with the P electrode while the other end runs through the P type GaN layer, the light-emitting layer, the N type GaN layer and the reflecting mirror and extends to the surface of the reflecting mirror; and the transparent substrate is bonded on the P surface of the GaN-based LED structure. The LED chip structure provided by the invention has the advantages of low electric leakage rate, capability of realizing the packaging-free effect, high luminous efficiency and the like.

Description

technical field [0001] The invention belongs to the technical field of semiconductors, in particular to a package-free high-brightness LED chip structure and a manufacturing method thereof. Background technique [0002] The existing LED chip structures mainly include: flip-chip structure, vertical chip structure and front-mount chip structure; among the above three chip structures, the flip-chip structure is the most commonly used mainstream chip structure. The existing flip-chip structure emits light from the back, and the efficiency of light extraction is low; and the growth substrate is not peeled off, and there is a large growth stress in the epitaxial layer, which makes the flip-chip structure have a large leakage rate; at the same time, the existing After the flip-chip structure is manufactured, resin or other materials need to be used for packaging, which increases the process steps and increases the production cost. Contents of the invention [0003] In view of th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01L33/02H01L33/46H01L33/00
CPCH01L33/0093H01L33/02H01L33/46
Inventor 郝茂盛袁根如张楠
Owner SHANGHAI XINYUANJI SEMICON TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products