Manufacturing method of flexible copper wiring board and flexible copper-clad laminated board with support film used therefor
A manufacturing method and technology for wiring boards, which are applied in bonding methods, chemical instruments and methods, and removal of conductive materials by chemical/electrolytic methods, etc., can solve the problems of lower yield, poor productivity, loss of raw materials, etc., and achieve yield High performance, high productivity and high dimensional stability
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Embodiment 1
[0050]
[0051] On one side of the usual CTE (Coefficient Of Thermal Expansion, coefficient of thermal expansion) grade polyimide resin (thickness: 38 μm, manufactured by Toray-DuPont Japan: Kapton150EN) as a resin film, 8 μm of copper is laminated by sputtering and electroplating, Further, a support film (thickness: 50 μm, improved PET film, heat shrinkage specification: 0.1% or less) is laminated on one side of the polyimide resin surface with an adhesive to form a flexible copper clad laminate with a support film Plate samples. In addition, a sample of a flexible copper-clad laminate not laminated with a support film was produced. It should be noted that the length of each sample is 156 mm in the MD direction and 160 mm in the TD direction.
[0052]
[0053] The above samples were subjected to etching treatment, heat treatment and peeling treatment of the supporting film. In addition, the peeling process of the support film was not performed to the sample to which the...
Embodiment 2
[0056] The test was carried out in the same manner as in Example 1, except that the resin film was made of low-CTE grade polyimide resin (thickness: 38 μm, manufactured by Toray-DuPont Japan: Kapton 150ENA).
Embodiment 3
[0058] Except having used the polyimide resin (thickness: 35 micrometers, manufactured by Ube Industries, Ltd.: Upilex35SGA) of the usual CTE grade as a resin film, it tested similarly to Example 1.
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