Evaporation device
A technology of evaporation device and evaporation source, which is applied in the direction of vacuum evaporation plating, metal material coating process, coating, etc., and can solve the problems of not being able to meet the adjustment of the area range
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[0028] The following descriptions of the various embodiments refer to the accompanying drawings to illustrate specific embodiments in which the invention may be practiced. The directional terms mentioned in the present invention, such as [top], [bottom], [front], [back], [left], [right], [inside], [outside], [side], etc., are only for reference The orientation of the attached schema. Therefore, the directional terms used are used to illustrate and understand the present invention, but not to limit the present invention. In the figures, structurally similar elements are denoted by the same reference numerals.
[0029] The present invention is aimed at the existing evaporation source device, the height and position of the limiting plate are fixed, and the spraying range of the nozzle is also fixed, which cannot meet the technical problem of adjusting the range of areas where different doping materials are deposited on the surface of the substrate. Embodiments can address this ...
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