Solar silicon wafer surface defect detection device

A solar silicon wafer and defect detection technology, which is applied in semiconductor/solid-state device testing/measurement, electrical components, circuits, etc., can solve the problems of silicon wafer damage, large mechanical loss, and low long-term efficiency, so as to facilitate mechanical control and facilitate The effect of short control and operation process
CN106992128AInactive Publication Date: 2017-07-28CHENGDU FUYU TECH
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Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
CHENGDU FUYU TECH
Publication Date
2017-07-28
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention relates to a solar silicon wafer surface defect detection device, comprising: a grabbing component, a circular track, a detection component, a driving system and a control system wherein the detection component consists of a photographing component 1 and a photographing component 2. The photographing component 1 is arranged under the suction plate. The position of the photographing component 1 is adapted to the motion trajectory of the suction plate. The photographing component 1 is used to photograph the bottom of the wafer and the photographing component 2 is used to photograph the top of the wafer. According to the invention, with the suction plate, one-time fetching and rotating of the silicon wafer are enough for the photographing of its front side and the back side for the detection of the wafer defects in appearance and size. Free from the face turning of the wafer, the structure of the grabbing component is simplified. The operation process is short, highly efficient and mechanical loss reducing. With the device, additional loss of a wafer product can be avoided; and the appearance quality is increased, while the cost is reduced.
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Claims

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