Positioning telescopic arm device used for reaction kettle cleaning

Abstract

The invention discloses a positioning telescopic arm device used for reaction kettle cleaning. The positioning telescopic arm device comprises a connecting manhole flange and fixing mechanism thereof, a chain external engaging rotation mechanism, a swing mechanism and a rope sheave drive telescopic arm mechanism. The connecting manhole flange and fixing mechanism thereof comprise a fixing flange, a flange connection fixing device, an inner disk, a rolling bearing and an anti-attrition wearing ring. The chain external engaging rotation mechanism comprises a driving chain wheel mechanism, a manual driving bevel gear mechanism and an annular chain. The swing mechanism comprises a linear ball screw linear guideway sliding table device, a sliding block, a connecting rod, a swing shaft, a main swing arm and a rotating handle. The rope sheave drive telescopic arm mechanism comprises a first telescopic arm, a second telescopic arm and a rope sheave assembly. Telescopic, swing and rotating motion of the telescopic arms can be achieved, the phenomenon of making contact with reaction kettle stirring blades and the inner wall of a reaction kettle can be effectively avoided during cleaning operations, and using safety of the mechanical system is improved. Meanwhile, by the adoption of a simple and common mechanical structure, the mechanical structure is stable and economic efficiency is high.

Description

technical field [0001] The invention relates to a reactor cleaning device, in particular to a positioning telescopic arm device for reactor cleaning. Background technique [0002] As the core device of chemical production, during the use of the reactor, due to scaling and sticking, the heat transfer performance will be reduced, the reaction time will be increased, and the wall of the reactor will be corroded. Therefore, the reactor should be cleaned. Commonly used cleaning methods for reactors include chemical cleaning and mechanical cleaning. Among them, the chemical cleaning method is to select a suitable cleaning agent according to the dirt components in the equipment. Removes dirt quickly and quickly. However, it may cause corrosion to the equipment. This method is suitable for soft, thin dirt. Contents of the invention [0003] The object of the present invention is to provide a positioning telescopic arm device for cleaning a reactor. [0004] The purpose of the...

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Problems solved by technology

but may cause corrosion to equipment

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