Quantum dot photoresist, quantum dot color filter substrate and display device
A color filter substrate and photoresist technology, applied in the field of quantum dots, can solve the problems of low solubility of quantum dots, poor substrate adhesion, poor stability, etc., and achieve the effects of improving optical performance and stability, reducing influence and improving solubility.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0049] The quantum dots modified by Tween 20 containing 200mg of QDs were mixed with 500mg of photoresist mother liquor, which included binder, photoresist monomer, photo or thermal initiator, photoresist soluble solvent and Active additives; uniform mixing, the mixing method is ultrasonic or stirring, and the stirring method includes mechanical stirring, magnetic stirring, etc.; rotary evaporation of the solvent to obtain uniformly dispersed quantum dot photoresist. The quantum dot photoresist is coated on the glass substrate with a black matrix, and photolithography is performed by light or heating to form color sub-pixels; then a protective layer and an ITO conductive film are sequentially arranged to form a quantum dot color film substrate.
Embodiment 2
[0051] Mix the polyethylene glycol-modified quantum dots containing 100mg of QDs with a degree of polymerization of 40 and 500mg of photoresist mother liquor, which includes adhesives, photoresist monomers, photo or thermal initiators, Solvent and active additives for dissolving the photoresist; after mixing evenly, the mixing method is ultrasonic or stirring, and the stirring method includes mechanical stirring, magnetic stirring, etc.; the solvent is rotated and evaporated to obtain uniformly dispersed quantum dot photoresist. The quantum dot photoresist is coated on a glass substrate with a black matrix, photolithography is performed by light or heating to form color sub-pixels, and then a protective layer and an ITO conductive film are sequentially arranged to form a quantum dot color film substrate.
Embodiment 3
[0053] Mix polyethylene glycol-modified quantum dots containing 100 mg of QDs with a degree of polymerization of 40, 20 mg of silica microspheres with a particle size of 1 micron, and 500 mg of photoresist mother liquor. The photoresist mother liquor includes binders, Photoresist monomers, photo or thermal initiators, photoresist-soluble solvents and active additives, the surface of silica microspheres are modified with polyethylene glycol segments and propylene groups; after mixing evenly, the mixing method is ultrasonic or The way of stirring, the way of stirring includes mechanical stirring, magnetic stirring, etc.; the solvent is rotated and evaporated to obtain uniformly dispersed quantum dot photoresist. The quantum dot photoresist is coated on a glass substrate with a black matrix, photolithography is performed by light or heating to form color sub-pixels, and then a protective layer and an ITO conductive film are sequentially arranged to form a quantum dot color film su...
PUM
| Property | Measurement | Unit |
|---|---|---|
| particle diameter | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More