Cleaning device for polycrystalline silicon production equipment

A technology for production equipment and cleaning devices, applied in crystal growth, post-processing devices, cleaning methods using tools, etc., can solve problems such as poor cleaning effect, and achieve the effect of improving cleaning effect, speeding up flow, and improving cleaning effect.

Inactive Publication Date: 2017-11-24
JIANGSU XINCHAO PV ENERGY DEV
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Aiming at the deficiencies of the prior art, the present invention provides a cleaning device for polysilicon production equipment, which has the advantage of good cleaning effect and solves the problem of poor cleaning effect of the existing equipment

Method used

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  • Cleaning device for polycrystalline silicon production equipment
  • Cleaning device for polycrystalline silicon production equipment

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Embodiment Construction

[0018] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0019] see Figure 1-2 A cleaning device for polysilicon production equipment, comprising a cleaning tank 1, a ring 3 is fixedly connected to the outside of the bottom of the cleaning tank 1, and a placement plate 4 runs through the middle of the ring 3, and the cleaning tank 1 can be driven by setting the ring 3 Rotation is conducive to improving the effect of cleaning, and the upper surface of placing plate 4 is fixedly connected with ultrasonic device 12, a...

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Abstract

The present invention relates to the technical field of polysilicon production equipment, and discloses a cleaning device for polysilicon production equipment, including a cleaning tank, a circular ring is fixedly connected to the outer side of the bottom end of the cleaning tank, and a placement plate runs through the middle of the circular ring. The upper surface of the placing plate is fixedly connected with an ultrasonic device, the bottom of the placing plate is fixedly connected with a fixed rod, the bottom end of the fixed rod is fixedly connected with a base, and both ends of the base are fixedly connected with a longitudinal support frame, The top end of the longitudinal support frame is fixedly connected with a fixed frame, and the middle part of the fixed frame is fixedly connected with a stirring motor. The cleaning device of the polysilicon production equipment is equipped with an ultrasonic device, and the ultrasonic vibrator generates strong vibrations to the cleaning solvent in the cleaning tank, increasing the contact strength between the solvent and the production equipment, and better cleaning the dead ends of the production equipment structure. Effect, to avoid the use of acid solvent cleaning to cause corrosion to production equipment.

Description

technical field [0001] The invention relates to the technical field of polysilicon production equipment, in particular to a cleaning device for polysilicon production equipment. Background technique [0002] Polycrystalline silicon is a form of elemental silicon. When molten elemental silicon solidifies under supercooled conditions, silicon atoms are arranged in the form of diamond lattices to form many crystal nuclei. If these nuclei grow into crystal grains with different crystal plane orientations, then These grains combine to crystallize into polysilicon. In the polysilicon production process, oil molecules, dust and other dirt are very harmful to polysilicon. It has been proved that the oil content of a few ppm in the entire process system may slow down the reaction speed of polysilicon, reduce the output, and even stop the silicon reaction. Therefore, In the process of equipment cleaning, it is very necessary to clean the dirt. Contents of the invention [0003] (1...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B3/12B08B3/10B08B3/08B08B1/04C30B35/00
CPCB08B3/12B08B1/002B08B1/04B08B3/08B08B3/102C30B35/00
Inventor 张靖田晓军姚兴平李素琴张何严磊
Owner JIANGSU XINCHAO PV ENERGY DEV
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